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Advanced Devices and Materials [Toriumi Laboratory]

TORIUMI / NAGASHIO LABORATORY. Department of Materials Engineering. Graduate School of Engineering. The University of Tokyo. 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, JAPAN. ADVANCED DEVICES and MATERIALS. OUR MAIN RESEARCH TOPICS ARE. Feb 23, 2015. Publication page was updated. Oct 25, 2014. Research page was updated. Oct 14, 2014. Conference list was updated (SSDM and JSAP). Sep 30, 2014. A new member Xu Lun (D1). May 14, 2014. The 2014 poster of our lab was updated. May 1, 2014. Apr 1, 2014.

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Advanced Devices and Materials [Toriumi Laboratory] | adam.t.u-tokyo.ac.jp Reviews

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TORIUMI / NAGASHIO LABORATORY. Department of Materials Engineering. Graduate School of Engineering. The University of Tokyo. 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, JAPAN. ADVANCED DEVICES and MATERIALS. OUR MAIN RESEARCH TOPICS ARE. Feb 23, 2015. Publication page was updated. Oct 25, 2014. Research page was updated. Oct 14, 2014. Conference list was updated (SSDM and JSAP). Sep 30, 2014. A new member Xu Lun (D1). May 14, 2014. The 2014 poster of our lab was updated. May 1, 2014. Apr 1, 2014.

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2 high k dielectrics

3 germanium renaissance

4 2d semiconductor properties

5 functional oxide fet

6 updates

7 general informations

8 school of engineering

9 materials engineering

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Advanced Devices and Materials [Toriumi Laboratory] | adam.t.u-tokyo.ac.jp Reviews

https://adam.t.u-tokyo.ac.jp

TORIUMI / NAGASHIO LABORATORY. Department of Materials Engineering. Graduate School of Engineering. The University of Tokyo. 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, JAPAN. ADVANCED DEVICES and MATERIALS. OUR MAIN RESEARCH TOPICS ARE. Feb 23, 2015. Publication page was updated. Oct 25, 2014. Research page was updated. Oct 14, 2014. Conference list was updated (SSDM and JSAP). Sep 30, 2014. A new member Xu Lun (D1). May 14, 2014. The 2014 poster of our lab was updated. May 1, 2014. Apr 1, 2014.

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adam.t.u-tokyo.ac.jp

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TORIUMI / NAGASHIO LABORATORY. Department of Materials Engineering, Graduate School of Engineering. The University of Tokyo. Department of Materials Engineering. Http:/ www.material.t.u-tokyo.ac.jp/material e/. Core Research for Evolutional Science and Technology). Http:/ www.jst.go.jp/kisoken/crest/. Http:/ www.jst.go.jp/kisoken/crest/pdf/crest eng pamph.pdf. Semiconductor Technology Academic Research Center ). Http:/ www.starc.jp/index-e.html. The Japan Society of Applied Physics ).

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先端デバイス工学研究室 [鳥海研究室]

http://www.adam.t.u-tokyo.ac.jp/publication.html

Dept of Materials Engineering, The Univ. of Tokyo. Tomonori Nishimura, Takeaki Yajima, and Akira Toriumi. Reexamination of Fermi level pinning for controlling Schottky barrier height at metal/Ge interface,. Applied Physics Express 9. 081201 (2016) ,. Published online July 15, 2016,. Http:/ doi.org/10.7567/APEX.9.081201. Lun Xu, Takeaki Yajima, Tomonori Nishimura, and Akira Toriumi,. Anomalous electrical properties of Au/SrTiO3 interface,. Japanese Journal of Applied Physics 55. 08PB04 (2016) ,. 5th Inter...

3

publication list

http://www.adam.t.u-tokyo.ac.jp/publication_e.html

TORIUMI / NAGASHIO LABORATORY. Department of Materials Engineering, Graduate School of Engineering. The University of Tokyo. C Lu, C. H. Lee, W. Zhang, T. Nishimura, K. Nagashio, and A. Toriumi. Enhancement of thermal stability and water resistance in yttrium-doped GeO2/Ge gate stack. Applied Physics Letters 104. C H Lee, T. Nishimura, C. Lu, W. F. Zhang, K. Nagashio, and A. Toriumi. Enhancement of High-Ns Electron Mobility in Ge(111) n-MOSFETs by the Formation of Atomically Flat GeO2/Ge Interface. R Ifu...

4

Advanced Devices and Materials [Toriumi Laboratory]

http://www.adam.t.u-tokyo.ac.jp/photos_e.html

TORIUMI / NAGASHIO LABORATORY. Department of Materials Engineering, Graduate School of Engineering. The University of Tokyo. Kabuyanagi (left) and Li (right) are measuring thermal desorption spectroscopy. Lu is sputtering high-k films. Nakamura measuring Raman spectroscopy. Nagata using Molecular Beam Epitaxy chamber. Lee manipulating ion implantation. Song processing samples with plasma. Ted measuring X-ray photoelectron spectroscopy. Fangan measuring internal photoelectron spectroscopy.

5

message from professor

http://www.adam.t.u-tokyo.ac.jp/prof_e.html

MESSAGE from Prof. TORIUMI. Keep your true pride with earnest passion in your heart. Open a new door you have not considered, and then you can find your style in your life. Look forward and Go Ahead. Inquiries on this page to hisho at adam.t.u-tokyo.ac.jp (at- @).

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Advanced Devices and Materials [Toriumi Laboratory]

TORIUMI / NAGASHIO LABORATORY. Department of Materials Engineering. Graduate School of Engineering. The University of Tokyo. 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, JAPAN. ADVANCED DEVICES and MATERIALS. OUR MAIN RESEARCH TOPICS ARE. Feb 23, 2015. Publication page was updated. Oct 25, 2014. Research page was updated. Oct 14, 2014. Conference list was updated (SSDM and JSAP). Sep 30, 2014. A new member Xu Lun (D1). May 14, 2014. The 2014 poster of our lab was updated. May 1, 2014. Apr 1, 2014.

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