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Adlyte: state of art EUV (Extreme Ultra Violet) light source for metrology and lithography applications.

Adlyte provides high brightness EUV (Extreme Ultra Violet) light sources for metrology and lithography applications. Companies developing EUV tools can depend on the reliability and operational performance of the Adlyte EUV sources. Our products enable high throughput and low down time in high volume manufacturing.

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Adlyte: state of art EUV (Extreme Ultra Violet) light source for metrology and lithography applications. | adlyte.com Reviews
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Adlyte provides high brightness EUV (Extreme Ultra Violet) light sources for metrology and lithography applications. Companies developing EUV tools can depend on the reliability and operational performance of the Adlyte EUV sources. Our products enable high throughput and low down time in high volume manufacturing.
<META>
KEYWORDS
1 Adlyte
2 LPP
3 mask inspection
4 reticle inspection
5 API
6 Patterned mask inspection
7 blank mask inspection
8 AIMS
9 Arial imaging mask inspection
10 brightness
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Adlyte: state of art EUV (Extreme Ultra Violet) light source for metrology and lithography applications. | adlyte.com Reviews

https://adlyte.com

Adlyte provides high brightness EUV (Extreme Ultra Violet) light sources for metrology and lithography applications. Companies developing EUV tools can depend on the reliability and operational performance of the Adlyte EUV sources. Our products enable high throughput and low down time in high volume manufacturing.

INTERNAL PAGES

adlyte.com adlyte.com
1

LPP light source for HVM inspection applications

http://www.adlyte.com/publications/HVM-inspection-applications.html

Provider of EUV turnkey light sources. Clean and stable LPP light source for HVM inspection applications. Bob Rollinger; Nadia Gambino; Andrea Z. Giovannini; Luna S. Bozinova; Flori Alickaj; Konrad Hertig; Reza S. Abhari; Fariba Abreau. Proc SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V, 90482K. (April 17, 2014) doi: 10.1117/12.2046416. To download a PDF version of the Adlyte press release please click below.

2

LPP light source for HVM inspection applications

http://www.adlyte.com/publications/dynamics-a-laser-produced-plasma.html

Provider of EUV turnkey light sources. Temporal and spatial dynamics of a laser-produced plasma through a multiple Langmuir probe detector. Nadia Gambino; Markus Brandstätter; Bob Rollinger; Reza S. Abhari. Proc SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V, 90482I. (April 17, 2014) doi: 10.1117/12.2046378. To download a PDF version of the Adlyte press release please click below.

3

Adlyte: State of art EUV products and services

http://www.adlyte.com/products/EUV-products.html

Provider of reliable EUV light sources. Offers brightness up to 200 W/mm. Sr for low power applications. The system is very compact and provides the lowest cost of ownership. Offers brightness up to 1000 W/mm. Sr at intermediate focus. The high brightness capability of this source provides extendibility for a range of applications. High Brightness-Brightness of up to 1000 W/mm. Sr enables high throughput. Low cost of ownership. Small footprint and easy to integrate with process tools. Designs, builds, an...

4

Adlyte: Company profile

http://www.adlyte.com/company/adlyte.html

Provider of EUV turnkey light sources. A spin-off from ETH Zurich, was formed in 2009 to commercialize the EUV LPP light source developed at ETH. Laboratory for Energy Conversion. LEC) Our team of world-class engineers and scientists have comprehensive history in providing turnkey EUV light sources. Adlyte applies fundamental breakthroughs in plasma physics and thermal management to produce an integrated fully-automated laser produced plasma (LPP) EUV light source.

5

Adlyte: state of art EUV (Extreme Ultra Violet) light source for metrology and lithography applications.

http://www.adlyte.com/events/press-release.html

Provider of EUV turnkey light sources. EUV LIGHT SOURCE DEVELOPER ADLYTE ACHIEVES KEY PERFORMANCE MILESTONE FOR HIGH-VOLUME MANUFACTURING. ZUG, Switzerland, October 22, 2014. Adlyte Inc., a developer of high-brightness extreme light sources for advanced semiconductor inspection and metrology applications, today announced it has reached a key performance benchmark for its extreme ultraviolet (EUV) light source. Which are critical for manufacturing future generations of advanced semiconductor devices.

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Adlyte: state of art EUV (Extreme Ultra Violet) light source for metrology and lithography applications.

Turnkey EUV light sources. Turnkey euv light sources. Provides the semiconductor industry with high brightness extreme ultraviolet (EUV) sources. Our laser produced plasma technology enables manufacturing of nano-scale devices. Companies producing EUV lithography and inspection tools can depend on the reliability and operational performance of Adlyte’s EUV sources. Adlyte’s products are designed to enable high efficiency and uptime in high volume manufacturing environment. View our publications archive.

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