Started in 1997, EUV Tech is one of the world's leading manufacturers of EUV metrology tools. Currently, EUV Tech holds over 90% of the world’s market share in delivered EUV metrology tools. EUV Tech's Reflectometer was selected by R&D Magazine in 2005 as 'One of the 100 Most Technologically Significant Products'. Currently, there are 12 Reflectometers in service worldwide. More About EUV Tech. 2840 Howe Road, Suite A. Martinez, CA 94553.
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EUV Tech | euvl.com Reviews
https://euvl.com
Started in 1997, EUV Tech is one of the world's leading manufacturers of EUV metrology tools. Currently, EUV Tech holds over 90% of the world’s market share in delivered EUV metrology tools. EUV Tech's Reflectometer was selected by R&D Magazine in 2005 as 'One of the 100 Most Technologically Significant Products'. Currently, there are 12 Reflectometers in service worldwide. More About EUV Tech. 2840 Howe Road, Suite A. Martinez, CA 94553.
euvl.com
EUV Tech
http://euvl.com/about.php
Dr Rupert Perera, PhD, MBA. Over 30 years experience in advanced x-ray optics at Lawrence Berkeley National Lab and other US national institutes. Pioneering contributor to the advancement of EUV Lithography tools. Over 12 years of experience in business management and corporate restructuring. Worked extensively with Fortune 500 companies to implement process improvements and business transformation. For purchasing information please email: sales@euvtech.com. 2840 Howe Road, Suite A. Martinez, CA 94553.
EUV Tech
http://euvl.com/resist-outgassing
Overview of resist testing tools for the NXE platform. Based on our experience with the first generation resist outgassing tool that has been fully operational for about 4 years with very good up time, we have developed and delivered a next generation resist outgassing tool for measuring the contamination of optics from resist outgassing by using 13.5 nm EUV photon exposure, or alternatively by using e-beam exposure, of resist coated 300 mm wafers and witness samples. A separate Kimball Physics EFG-7F/ E...
EUV Tech
http://euvl.com/news
EUV Tech delivers a next-generation HVM EUV Reflectometer. August 26th, 2015. EUV Tech delivers a next-generation Reflectometer to evaluate the reflectivity and uniformity of EUV photomasks to a major U.S chip manufacturer. The new tool extends EUV Tech's lead in developing metrology equipment to support next-generation EUV lithography. 2840 Howe Road, Suite A. Martinez, CA 94553.
EUV Tech
http://euvl.com/careers
At EUV Tech, we are always on the lookout for talented individuals. Send us an email to jobs@euvtech.com. With your qualifications and we will be in contact if there is a position. EUV Tech is an equal opportunity employer. EUV Tech Mechanical Engineer. Ability to work from concepts and sketches provided by Senior Staff and use Solidworks to produce models, detailed parts, and drawings of parts for fabrication. Assist in the development and evaluation of prototypes of new instrumentation. 2-3 years of ex...
EUV Tech
http://euvl.com/hydrogen-cleaner
Specifications of the EUV Technology Stand-alone Hydrogen Radical cleaning unit Model No. HC12.1. Filament temperature:1850 to 2000 C. H2 flow: 50 SCCM (max). H2 pressure: 20 mbar (max). Sample temperature: 60 C (max). Cleaning rate 3 nm/hour. MFC to control the H2 flow. Another MFC to control the N2 flow. Diluted to 1% by volume before exhausting. Interlocked so that H2 will not flow if there is not sufficient N2 flow to dilute the H2. Fully automated user friendly operation. 2840 Howe Road, Suite A.
TOTAL PAGES IN THIS WEBSITE
7
EUV Tech
http://www.euvtech.com/about.php
Dr Rupert Perera, PhD, MBA. Over 30 years experience in advanced x-ray optics at Lawrence Berkeley National Lab and other US national institutes. Pioneering contributor to the advancement of EUV Lithography tools. Over 12 years of experience in business management and corporate restructuring. Worked extensively with Fortune 500 companies to implement process improvements and business transformation. For purchasing information please email: sales@euvtech.com. 2840 Howe Road, Suite A. Martinez, CA 94553.
EUV Tech
http://www.euvtech.com/reflectometer
EUV Technology has pioneered the development of several of stand-alone inspection, metrology, calibration, and resist out-gassing testing tools for EUV lithographic applications that can be operated in a clean room environment on the floor of a fab. EUV Technology is the world’s leading manufacturer of EUV metrology and testing tools. One of the principal challenges in the ongoing EUVL research effort is the development of necessary at-wavelength metrology tools. Nd:YAG laser and laser optical system.
EUV Tech
http://www.euvtech.com/about
Dr Rupert Perera, PhD, MBA. Over 30 years experience in advanced x-ray optics at Lawrence Berkeley National Lab and other US national institutes. Pioneering contributor to the advancement of EUV Lithography tools. Over 12 years of experience in business management and corporate restructuring. Worked extensively with Fortune 500 companies to implement process improvements and business transformation. For purchasing information please email: sales@euvtech.com. 2840 Howe Road, Suite A. Martinez, CA 94553.
EUV Tech
http://www.euvtech.com/resist-outgassing
Overview of resist testing tools for the NXE platform. Based on our experience with the first generation resist outgassing tool that has been fully operational for about 4 years with very good up time, we have developed and delivered a next generation resist outgassing tool for measuring the contamination of optics from resist outgassing by using 13.5 nm EUV photon exposure, or alternatively by using e-beam exposure, of resist coated 300 mm wafers and witness samples. A separate Kimball Physics EFG-7F/ E...
EUV Tech
http://www.euvtech.com/hydrogen-cleaner
Specifications of the EUV Technology Stand-alone Hydrogen Radical cleaning unit Model No. HC12.1. Filament temperature:1850 to 2000 C. H2 flow: 50 SCCM (max). H2 pressure: 20 mbar (max). Sample temperature: 60 C (max). Cleaning rate 3 nm/hour. MFC to control the H2 flow. Another MFC to control the N2 flow. Diluted to 1% by volume before exhausting. Interlocked so that H2 will not flow if there is not sufficient N2 flow to dilute the H2. Fully automated user friendly operation. 2840 Howe Road, Suite A.
EUV Tech
http://www.euvtech.com/news
EUV Tech delivers a next-generation HVM EUV Reflectometer. August 26th, 2015. EUV Tech delivers a next-generation Reflectometer to evaluate the reflectivity and uniformity of EUV photomasks to a major U.S chip manufacturer. The new tool extends EUV Tech's lead in developing metrology equipment to support next-generation EUV lithography. 2840 Howe Road, Suite A. Martinez, CA 94553.
EUV Tech
http://www.pereravineyard.com/about.php
Dr Rupert Perera, PhD, MBA. Over 30 years experience in advanced x-ray optics at Lawrence Berkeley National Lab and other US national institutes. Pioneering contributor to the advancement of EUV Lithography tools. Over 12 years of experience in business management and corporate restructuring. Worked extensively with Fortune 500 companies to implement process improvements and business transformation. For purchasing information please email: sales@euvtech.com. 2840 Howe Road, Suite A. Martinez, CA 94553.
EUV Tech
http://www.pereravineyard.com/hydrogen-cleaner
Specifications of the EUV Technology Stand-alone Hydrogen Radical cleaning unit Model No. HC12.1. Filament temperature:1850 to 2000 C. H2 flow: 50 SCCM (max). H2 pressure: 20 mbar (max). Sample temperature: 60 C (max). Cleaning rate 3 nm/hour. MFC to control the H2 flow. Another MFC to control the N2 flow. Diluted to 1% by volume before exhausting. Interlocked so that H2 will not flow if there is not sufficient N2 flow to dilute the H2. Fully automated user friendly operation. 2840 Howe Road, Suite A.
EUV Tech
http://www.pereravineyard.com/resist-outgassing
Overview of resist testing tools for the NXE platform. Based on our experience with the first generation resist outgassing tool that has been fully operational for about 4 years with very good up time, we have developed and delivered a next generation resist outgassing tool for measuring the contamination of optics from resist outgassing by using 13.5 nm EUV photon exposure, or alternatively by using e-beam exposure, of resist coated 300 mm wafers and witness samples. A separate Kimball Physics EFG-7F/ E...
EUV Tech
http://www.pereravineyard.com/careers
At EUV Tech, we are always on the lookout for talented individuals. Send us an email to jobs@euvtech.com. With your qualifications and we will be in contact if there is a position. EUV Tech is an equal opportunity employer. EUV Tech Mechanical Engineer. Ability to work from concepts and sketches provided by Senior Staff and use Solidworks to produce models, detailed parts, and drawings of parts for fabrication. Assist in the development and evaluation of prototypes of new instrumentation. 2-3 years of ex...
TOTAL LINKS TO THIS WEBSITE
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EUV Tech
Started in 1997, EUV Tech is one of the world's leading manufacturers of EUV metrology tools. Currently, EUV Tech holds over 90% of the world’s market share in delivered EUV metrology tools. EUV Tech's Reflectometer was selected by R&D Magazine in 2005 as 'One of the 100 Most Technologically Significant Products'. Currently, there are 12 Reflectometers in service worldwide. More About EUV Tech. 2840 Howe Road, Suite A. Martinez, CA 94553.
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EUV Labs | Technological Engineering Company
EUV Labs is an independent research and technical development company, active in multidisciplinary applications of plasma physics, atomic spectroscopy, plasma sources of radiation and discharge physics. The company has originated from the Institute for Spectroscopy RAS. The combination experimental skills in various fields of physics with advanced numerical simulation models is our key advantage. Detailed specs on RnD-Metr metrology product line.
EUV Litho, Inc. – Promoting EUV Lithography via Workshops, Consulting & Education
EUV Litho, Inc. Promoting EUV Lithography via Workshops, Consulting and Education. 2018 EUVL Workshop – Final Call for Papers. June 11-14, 2018, CXRO, Berkeley, CA. Post – deadline Poster Paper Abstract Submission Deadline: May 18, 2018. Please contact us at info@euvlitho.com if you have questions about your abstract or workshop in general. Join us to explore EUVL status, challenges and their potential solutions in the industry’s premier R&D workshop. Now in its eleventh year! First Call for Papers.
