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Welcome to Integrated Micro Materials; your premier source for lithography products and micro-manufacturing consultation services! At IMM we strive for industry leadership in service and customer satisfaction and take pride in exceeding your expectations! We stock a wide variety of Photoresists and Anti-Reflective Coatings along with the companion Developers, Thinners, and *********, to meet the demands of almost any microlithography application.

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Welcome to Integrated Micro Materials; your premier source for lithography products and micro-manufacturing consultation services! At IMM we strive for industry leadership in service and customer satisfaction and take pride in exceeding your expectations! We stock a wide variety of Photoresists and Anti-Reflective Coatings along with the companion Developers, Thinners, and *********, to meet the demands of almost any microlithography application.
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1 photoresist
2 lithography
3 developer
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5 microlithography
6 anti-reflective
7 ebeam
8 ebeam photoresist
9 e-beam photoresist
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Home | imicromaterials.com Reviews

https://imicromaterials.com

Welcome to Integrated Micro Materials; your premier source for lithography products and micro-manufacturing consultation services! At IMM we strive for industry leadership in service and customer satisfaction and take pride in exceeding your expectations! We stock a wide variety of Photoresists and Anti-Reflective Coatings along with the companion Developers, Thinners, and *********, to meet the demands of almost any microlithography application.

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1

Lithography Process Overview

http://www.imicromaterials.com/technical/lithography-process-overview

Your Premier Source for Micro Imaging Materials! Reflectivity Control in Lithography. AZ nLoF 2000 Profile Tuning. AZ 5200 Image Reversal Recipe. Line/Space and square hole images in AZ 15nXT Photoresist. Oxidic surfaces such as SiO. And oxide forming Si or Al based substrates will exhibit surface OH bonds and may be too hydrophilic for resist adhesion even after the clean and dehydration bake. These surfaces typically require treatment with a chemical adhesion promoter such as HMDS (hexamethyldisila...

2

Anti-Reflective Coatings

http://www.imicromaterials.com/products/anti-reflective-coatings

Your Premier Source for Micro Imaging Materials! Reflectivity Control in Lithography. AZ nLoF 2000 Profile Tuning. AZ 5200 Image Reversal Recipe. AZ BARLi II Series Bottom Anti-Reflective Coatings for i-line. Reflectivity and Swing Ratio Reduction by AZ BARLi II. Contact your IMM technical representative for more information on Anti-Reflective Coatings. AZ KrF-17B Series Bottom Anti-Reflective Coatings for 248nm Lithography. AZ Aquatar and Aquatar VIII Series Top Anti-Reflective Coatings. AZ Aquatar prod...

3

Lift-Off Photoresists

http://www.imicromaterials.com/products/lift-off-photoresists

Your Premier Source for Micro Imaging Materials! Reflectivity Control in Lithography. AZ nLoF 2000 Profile Tuning. AZ 5200 Image Reversal Recipe. AZ nLoF 2000 Series. AZ nLoF 2035 Photoresist @ 3.5µm film thickness. 20µm dense lines @ 72mJ/cm2. Single puddle develop in AZ 300MIF. AZ nLoF 5510 Photoresist @ 1.0µm film thickness. 028µm dense lines @ 0.60NA (i-line). Single puddle develop in AZ 300MIF. AZ 5214E-IR is an image reversal photoresist that may be processed in either positive or negative tone&#46...

4

DUV Photoresists

http://www.imicromaterials.com/products/duv-photoresists

Your Premier Source for Micro Imaging Materials! Reflectivity Control in Lithography. AZ nLoF 2000 Profile Tuning. AZ 5200 Image Reversal Recipe. AZ TX-1311 High Aspect Ratio DUV Photoresist. I would like more information on AZ TX 1311 Photoresist! IMM and the IMM logo are trademarks of H2A Technologies, Inc. Website Services Provided By:.

5

Developers

http://www.imicromaterials.com/products/developers

Your Premier Source for Micro Imaging Materials! Reflectivity Control in Lithography. AZ nLoF 2000 Profile Tuning. AZ 5200 Image Reversal Recipe. MIF (Metal Ion Free) Developers. AZ 300MIF Developer is a metal ion free industry standard 0.261N TMAH (Tetra Methyl Ammonium Hydroxide) based developer. Normality controlled to 0.0001N for the ultimate in process control. This developer is surfactant free. Inorganic (Metal Containing Developers). AZ 400K Series Developers. AZ 400K Series Developers are buffere...

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Your Premier Source for Micro Imaging Materials! Reflectivity Control in Lithography. AZ nLoF 2000 Profile Tuning. AZ 5200 Image Reversal Recipe. Welcome to Integrated Micro Materials! Your premier source for lithography products and micro-manufacturing consultation services! At IMM we strive for industry leadership in service and customer satisfaction and take pride in exceeding your expectations! Authorized distributors for AZ lithography products from EMD Performance Materials!

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