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POSTECH, Bio-Medical Electrics Laboratory (Bio-Me)

Department of Electrical Engineering. Pohang University of Science and Technology. San-31, Hyoja, Pohang, 790-784, S. Korea. Last revised on March 8, 2013). Professor : Jae Koo Lee. Ph D : Hyoung Cheol Kwon, Sung Kil Kang, Myoung Soo Kim, Hyun Wook Lee, Ho Young Kim, Im Hee Won. M S : Soon Ku Kwon, Chang Woo Myung. Plasma Processing of Semiconductors. Numerical Modelings of Dry Etching Processes and Plasma Devices such as Neutral Beam Etching, ICP Source, CCP Source, and Magnetron Sputter. Plasma Process...

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POSTECH, Bio-Medical Electrics Laboratory (Bio-Me) | jkl.postech.ac.kr Reviews

<META> DESCRIPTION

Department of Electrical Engineering. Pohang University of Science and Technology. San-31, Hyoja, Pohang, 790-784, S. Korea. Last revised on March 8, 2013). Professor : Jae Koo Lee. Ph D : Hyoung Cheol Kwon, Sung Kil Kang, Myoung Soo Kim, Hyun Wook Lee, Ho Young Kim, Im Hee Won. M S : Soon Ku Kwon, Chang Woo Myung. Plasma Processing of Semiconductors. Numerical Modelings of Dry Etching Processes and Plasma Devices such as Neutral Beam Etching, ICP Source, CCP Source, and Magnetron Sputter. Plasma Process...

<META> KEYWORDS

1 members

2 old members

3 research areas

4 interdisciplinary bio medical electrics

5 recent group's works

6 computing facilities

7 publications

8 journals and conferences

9 patents

10 position openings

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POSTECH, Bio-Medical Electrics Laboratory (Bio-Me) | jkl.postech.ac.kr Reviews

https://jkl.postech.ac.kr

Department of Electrical Engineering. Pohang University of Science and Technology. San-31, Hyoja, Pohang, 790-784, S. Korea. Last revised on March 8, 2013). Professor : Jae Koo Lee. Ph D : Hyoung Cheol Kwon, Sung Kil Kang, Myoung Soo Kim, Hyun Wook Lee, Ho Young Kim, Im Hee Won. M S : Soon Ku Kwon, Chang Woo Myung. Plasma Processing of Semiconductors. Numerical Modelings of Dry Etching Processes and Plasma Devices such as Neutral Beam Etching, ICP Source, CCP Source, and Magnetron Sputter. Plasma Process...

INTERNAL PAGES

jkl.postech.ac.kr

1

Patents of iGEL

http://jkl.postech.ac.kr/patent.html

Recent Patents of Postech iGEL. Last updated on February 1, 2012). Àú Â ÇÃ óÁî ÀÌ ëÇÑ ÁöÇ ÀåÄ. J Choi, J.K. Lee, and S.Y. Sim. 2011 6. 20. Ï Æ Ä á ë ÁßÇÕÃ ë â Ð ÇÃ óÁî ÀåÄ. JK Lee, G.J. Kim. 2011 10. 19. Portable microwave plasma generator capable of generating plasma with low electric power. J Choi, J.K. Lee, and F. Iza. 2009 3. 6. ÀÌÅ ÎÆÄ ÇÃ óÁî ý ºÀ À ÇÑ ÈÞ ë ë Àü Â ø Þ ÀåÄ. Portable power module for microwave-excited microplasmas). J Choi, J.Y. Sim, and J.K. Lee. 2009 2. 18. 2009 2. 4. 2009 1. 28.

2

EECE695I Low Temperature Plasma

http://jkl.postech.ac.kr/EECE695_08Spring

EECE695I Low Temperature Plasma (2008). 2 ö ú ñ ö ÀÇ ÇÊ öçÇ. 3 ºÀû Æò æ ý. 6 ÀÇ Áøµµ èÈ. 7 âÅ Âü í çÇ. 8 ÀÇ ÀÚ á. Ø ÀÇ ÀÚ á Â ÆÄ öÆ ÀÎÆ ÆÄÀÏ(ppt) Î ÕÀú Ù îÀ Þ Æ ÇÁ Æ. ÇÏ ç ëÇÏ Ê Ã ä. ÉÇÏ é Microsoft EquationÀÌ Ä µÇ î ÀÖ Â ÄÄÇÅÍ ÇÁ Æ. ÇÏ Â ÍÀÌ ÁÁ À Ï Ù. Ø Zip ÆÄÀÏÀÌ ÀÌ ÀÖ Â ÍµéÀº ÁÖ Î ºÄµÇÑ ÆÄÀÏµé ÀÔ Ï Ù. µÇµµ Ï zip ÆÄÀÏÀ Ù î Þ Æ ÇÁ Æ ÇÏ Ã â Ù ø Ï Ù.

3

EECE490U Bio plasma modeling

http://jkl.postech.ac.kr/EECE490S_11

The fundamentals to the use of E&M (electricity and magnetism) and APP (atmospheric pressure plasmas) for biomedicine to be covered. Some basics of molecular biology and thermodynamics to be included. The actual applications of E&M and APP devices to sterilization, coagulation, dental and skin cares, and cancer treatment to be covered. Subjects to be covered: -Molecular Cell Biology-Thermodynamics and Chemical Kinetics- Diagnostics and Modelings. 선수 과목 및 수강의 필수사항. D bio-electric research papers. Week 1 ,2.

4

ECE654 Plasma Processing

http://jkl.postech.ac.kr/EECE654_09

EECE654 Plasma Processing (2009). Basic principle of low-temp. plasmas, plasma devices (CCP, PDP, and ICP in particular),. Etching/deposition/plasma display and LCD backlight unit (BLU). 2 ö ú ñ ö ÀÇ ÇÊ öçÇ. One course of E&M. 3 ºÀû Æò æ ý. MA Lieberman and AJ Lichtenberg: Principles of Plasma Discharge and Materials Processing, 2nd ed.(Wiley 2005). FF Chen and J.P. Chang: Lecture Notes on Principles of Plasma Processing (Kluwer/Plenum 2003). 6 ÀÇ Áøµµ èÈ. Week (1-3) low-temperature plasma basics.

5

Computer Simulation (EECE695, 2005)

http://jkl.postech.ac.kr/EECE695_05Fall

Computer Simulation (EECE695, 2005). Basics of simple modeling, numerical analysis, and computer-intensive simulation for applied and advanced E&M and charged particles (some plasma modeling included). 2 강의 선수/수강 필수 사항. Some basic knowledge of one of computer languages, C or Fortran. S Nakamura: Applied Numerical Methods in C, Prentice Hall (1995) or its Fortran version (1991). S/U or letter grades (student auditing discouraged). To be graded separately in two classes, simulation major and non-major.

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POSTECH, Bio-Medical Electrics Laboratory (Bio-Me)

Department of Electrical Engineering. Pohang University of Science and Technology. San-31, Hyoja, Pohang, 790-784, S. Korea. Last revised on March 8, 2013). Professor : Jae Koo Lee. Ph D : Hyoung Cheol Kwon, Sung Kil Kang, Myoung Soo Kim, Hyun Wook Lee, Ho Young Kim, Im Hee Won. M S : Soon Ku Kwon, Chang Woo Myung. Plasma Processing of Semiconductors. Numerical Modelings of Dry Etching Processes and Plasma Devices such as Neutral Beam Etching, ICP Source, CCP Source, and Magnetron Sputter. Plasma Process...

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