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| Lotus Applied Technology

| Breaking ALD Speed and Cost Barriers

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About | Lotus Applied Technology

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Breaking ALD Speed and Cost Barriers. Roll to Roll ALD. Roll to Roll ALD. Six P400 Conventional Pulse-Based Batch ALD reactors. Roll to Roll ALD Research Scale Reactor. TransFlex Roll to Roll ALD Pilot Scale Reactor. Vortex Rotary Batch Reactor. We don’t manufacture coating equipment at Lotus. Rather, we deliver our unique technology in collaboration with specialty thin film coating equipment manufacturers – either our existing partners, or the equipment supplier of your choice. Roll to Roll ALD.

2

Rotary ALD | Lotus Applied Technology

http://www.lotusat.com/rotary-ald

Breaking ALD Speed and Cost Barriers. Roll to Roll ALD. Roll to Roll ALD. Vortex Rotary Batch ALD by Lotus Applied Technology. Any other surface above the plane of the substrates. At batch coating speeds over 5 Å/second, while preserving the unique high quality attributes of ALD coatings. Deposited using Vortex Rotary ALD. Lotus’ Vortex Rotary ALD offers many advantages, including:. Batch deposition speeds of several angstroms per second faster than many oxide sputtering processes. Roll to Roll ALD.

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Applications | Lotus Applied Technology

http://www.lotusat.com/rotary-ald/applications

Breaking ALD Speed and Cost Barriers. Roll to Roll ALD. Roll to Roll ALD. Lotus’ Vortex batch ALD technology is ideally suited to displace conventional ALD in semiconductor processing. But because of its high speed deposition and low materials costs, it is also poised to extend ALD to a broad set of applications historically served by CVD, sputtering, and evaporation processes, including:. Hermetic encapsulation and protection for rigid substrates and devices. Direct encapsulation of CIGS and OPV panels.

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Roll to Roll ALD | Lotus Applied Technology

http://www.lotusat.com/roll-to-roll-ald

Breaking ALD Speed and Cost Barriers. Roll to Roll ALD. Roll to Roll ALD. Roll to Roll ALD. TransFlex Roll to Roll ALD by Lotus Applied Technology. Our unique patented technology for roll to roll ALD achieves high speed, low cost deposition in a remarkably simple way. We simply weave the flexible substrate back and forth between physically separated precursors regions, as illustrated by animation:. Direct compatibility with continuous Roll to Roll processing at speeds up to 100 meters per minute.

5

Applications | Lotus Applied Technology

http://www.lotusat.com/roll-to-roll-ald/applications

Breaking ALD Speed and Cost Barriers. Roll to Roll ALD. Roll to Roll ALD. Lotus’ TransFlex Roll to Roll ALD technology is ideally suited to the deposition of relatively thin ALD films, where high performance, high volume, and low coating cost are all critical. Ultra-Barrier films for Flexible Electronics. We’ve demonstrated barrier performance and low coating costs suitable for several specific end products, including:. CIGS photovoltaics and OP. Military and emergency packaging, including MRE’s.

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原理 | ALD Japan, Inc.

http://aldjapan.com/原理

Atomic Layer Deposition 原子層堆積技術について. 材料A 蒸気 ガス の状態で、プリカーサーとか前駆体と呼ばれる を投入. 例 TMA = トリメチルアルミニウム 有機金属、つまり有機物と金属の化合物. 例 H2O 要は 水 です。 この4つのステップでAl アルミニウム とO 酸素 をレイヤー形成 製膜します 実質的にはAlx1レイイヤー Ox1レイヤーの2つのレイヤー。 アルミナ Al2O3 の製膜で例えると、 TMA トリメチルアルミニウム の投入 パージ H2O (水 蒸気の投入 パージとなります。 例、Al2O3製膜は1サイクルでおよそ1Å オングストローム 0.1nm づつ製膜ができるので、10nm (=100Å) の膜厚がほしければ、100サイクルのレシピを組みます。 CVDとはChemical Vapor Deposition 化学的気相成長 、PVDとはPhysical Vapor Deposition 物理的気相成長 の略で、それぞれ半導体などの製造に使われる成膜技術です。 空間的 ALD 又はS-ALD です。 ALD Japan, Inc.

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Spacial ALD (空間的ALD) – コスト低減化へ | 未分類 | ALD Japan, Inc.

http://aldjapan.com/未分類/spacial-ald-空間的ald-コスト低減化へ

Atomic Layer Deposition 原子層堆積技術について. Spacial ALD (空間的ALD) – コスト低減化へ. Spacial ALD (空間的ALD) – コスト低減化へ. 投稿日 : 2015/04/24 カテゴリー : 未分類. 代表的な開発会社 Lotus Applied Technology. 上記のハードウエアの図は、国際学会 ALD2015 で行なわれてVeeco 社とLotus 社の発表資料を基に作成しました。 6月28日から国際学会 ALD2015 開催 →. ALD Japan, Inc.

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BALD Engineering - Born in Finland, Born to ALD: ALD Companies

http://www.blog.baldengineering.com/p/ald-companies.html

BALD Engineering - Born in Finland, Born to ALD. ALD News on Twitter. ALD / CVD Precursor Report 2016. Please contact me if you want to display your company here : jonas.sundqvist@baldengineering.com. Aixtron : http:/ www.aixtron.com/en/home/. ALD Nanosolutions : https:/ www.aldnanosolutions.com/. Applied Materials : www.appliedmaterials.com. Arradiance : http:/ www.arradiance.com/. ASM International : www.asm.com. Beneq : http:/ beneq.com/. Denton Vacuum : http:/ www.dentonvacuum.com/. Tokyo Electron : ...

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| Lotus Applied Technology

Breaking ALD Speed and Cost Barriers. Roll to Roll ALD. Roll to Roll ALD. Welcome to Lotus Applied Technology, LLC. At Lotus, we’re a technology partner, not simply a vendor. We specialize in collaborative and innovative solutions leveraging our unique background and technologies. Roll to Roll ALD. 2018 Lotus Applied Technology.

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