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Materials Science, Inc.. - Sputtering and Plasma Source Technology

High Target Utilization - High Performance Magnetron Sputtering Sources,. Power Supplies and Accessories. We Provide Engineered Solutions - Exactly the Right Source for Your Process and System Needs. DC Magnetron Sputtering Power Supplies. With Advanced Arc Suppression. RF Power Supplies and. Polaris 2 and 3 Research Sources. Last modified: 13 January 2017.

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Materials Science Inc.

1662 L●●●●●●s Road

San●●●ego , CA, 92109

US

1.85●●●●3223
jm●●●●●@msi-pse.com

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Materials Science, Inc.

Miller, John

1662 L●●●●●●s Road

San●●●ego , CA, 92109

US

858-●●●●3223
jm●●●●●@msi-pse.com

View this contact

Materials Science Inc.

Materials Science Inc.

1662 L●●●●●●s Road

San●●●ego , CA, 92109

US

1.85●●●●3223
jm●●●●●@msi-pse.com

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Materials Science, Inc.. - Sputtering and Plasma Source Technology | msi-pse.com Reviews
<META>
DESCRIPTION
High Target Utilization - High Performance Magnetron Sputtering Sources,. Power Supplies and Accessories. We Provide Engineered Solutions - Exactly the Right Source for Your Process and System Needs. DC Magnetron Sputtering Power Supplies. With Advanced Arc Suppression. RF Power Supplies and. Polaris 2 and 3 Research Sources. Last modified: 13 January 2017.
<META>
KEYWORDS
1 high utilization
2 narrow width sources
3 performance characteristics
4 sunsource
5 round sources
6 kamlok
7 fast target
8 exchange system
9 sputtering packages
10 linear/rectangular sources
CONTENT
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high utilization,narrow width sources,performance characteristics,sunsource,round sources,kamlok,fast target,exchange system,sputtering packages,linear/rectangular sources
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Materials Science, Inc.. - Sputtering and Plasma Source Technology | msi-pse.com Reviews

https://msi-pse.com

High Target Utilization - High Performance Magnetron Sputtering Sources,. Power Supplies and Accessories. We Provide Engineered Solutions - Exactly the Right Source for Your Process and System Needs. DC Magnetron Sputtering Power Supplies. With Advanced Arc Suppression. RF Power Supplies and. Polaris 2 and 3 Research Sources. Last modified: 13 January 2017.

INTERNAL PAGES

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1

SunSource Round Magnetron Sputtering Sources

http://www.msi-pse.com/SunSource%20Round%20Home%20Page.htm

GEN II Round Planar Magnetron Sputtering Sources. Typical GEN II Internal Mount Configuration Typical GEN II Adjustable Internal Mount with Tilt and Shutter on CF Flange Typical GEN II Flange Mount Configuration. SunSource Round Planar Magnetron Sputtering Source Sales Brochure: MC 310 5/12. Wide Uniform Erosion Area results in stable operation, minimal distribution and uniformity/rate changes throughout the target lifetime. Available in 4 to 8 Diameter Targets. Internal and Flange Mount Configurations.

2

Ordering from Materials Science, Inc.

http://www.msi-pse.com/ordering_information.htm

Ion DC Magnetron Sputtering Power Supplies and Accessories. RF Power Supplies, Impedance Matching Networks and Accessories. Polaris GEN II Sputtering Sources and Sputtering Packages, Spare Parts and Accessories. SunSource Round Sputtering Sources, Spare Parts and Accessories. SunSource Rectangular/Linear Sputtering Sources. We accept the following credit cards for payment. Last modified: 02 January 2014.

3

Polaris GEN II R&D Sources

http://www.msi-pse.com/Polaris.htm

2 and 3 Sputtering Sources for Research,. Development and Prototype Production. Industrial Performance in a Small Size. Sales Brochure MC 600 02/08. Product Specification 451002 02/08. Product Specification Supplement for Target Mounting 451003, Rev. B 06/10. Only Source With Integral Gas Injection - Additional Feedthroughs and Manifolds Unnecessary. Stable Operation at Very Low Powers and Rates. Power Levels 2x Compared to Competing Designs. Bonded, Clamped and Directly Cooled Targets. Assembled on Cath...

4

How Sputtering Works

http://www.msi-pse.com/magnetron_sputtering.htm

Download Technology Note TN 000 100 02/03. General Principle of Operation. The above illustration describes a generic manifestation of a magnetron sputtering source. DC, pulsed DC, AC and RF power supplies may be used, depending upon target material, if reactive sputtering is desired and other factors. Positively charged argon ions from the plasma are accelerated toward the negatively biased target (cathode), resulting in material being sputtered from the target surface. Influence of the Magnet Design.

5

Modeling Software

http://www.msi-pse.com/modeling_software.htm

Monte Carlo Film Thickness Distribution Modeling Software. SunSource Modeler Distribution Modeling Software for Round Cathodes. Download this file to the desired directory on your computer, upzip setup.exe and follow the instructions in the installation program. Become familiar with the readme file before using. This is a widely distributed, very accurate modeling program developed by Materials Science, Inc. used to establish the effects of very basic process geometries such as source-to-substrate di...

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nanovationllc.com nanovationllc.com

Nanovation LLC

http://www.nanovationllc.com/default.asp

Nanovation carries several product offerings geared to the fields of High Vacuum, Thin Film, and Nanotechnology. We cater primarily to the Central and North Central US region. Custom hermetically sealed components. Ceramic to metal, ceramic to glass. Veeco Ion Beam Components. Ion Beam Sources, Round, Linear, End-Hall, RF,. Spector Precision Optical Coating. Surface profilers, contact, non-contact. High vacuum deposition systems, evaporation, sputtering. Cryopump repair and rebuilding. Plymouth, MN 55442.

intlvac.ca intlvac.ca

Materials Science, Inc. | Intlvac Canada

http://www.intlvac.ca/product-line/materials-science-inc

You are visiting our Canadian site. Visit our international site. Thin Film Coating Services. Brooks - CTI Cryogenics. MPF - Ceramic to Metal Technology. Materials Science, Inc. Brooks - CTI Cryogenics. MPF - Ceramic to Metal Technology. Materials Science, Inc. Materials Science, Inc. Materials Science, Inc. Intlvac a division of 3223311 Canada Inc., 247 Armstrong Avenue, Georgetown, Ontario, L7G 4X6, CANADA Phone: 905.873.0166 Toll Free: 800.959.5517.

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SCCAVS Exhibition/Symposium/Short Courses

http://www.sccavs.org/symposium2015.html

Upcoming Meetings and Symposia. Http:/ www.avs.org. 2015 SCCAVS Equipment Exhibition, Short Courses & Student Poster Session. Learn about the latest advances in vacuum products, technology, and science. Network with other key players in the Southern California technical community. Tuesday, September 29, 2015. Short Courses September 28 30). Holiday Inn Buena Park. Attendance to the Exhibition is Free! Free Helium Leak Testing Workshop 9:30-11:30 am. Free Lunch 12:00 - 1:00 pm. Directions to the Exhibition.

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Some Of Our Clients - Welkley & Tucker Inc.

http://www.wt-cpas.com/clients.html

Phone: (408) 249.5300. Fax: (408) 249.5315. Estate and Trust Services. Tax Tip Of The Week. Business Tip Of The Month. Financial Tip Of The Month. Some Of Our Clients. Some Of Our Clients. Artcraft Welding, Inc. Custom Stainless Steel Baskets, Precision Cleaning Fixtures. Employment placement agency, specializing in accounting. The Blakely Group, Inc. Portfolio and Wealth Management. Materials Science, Inc. Website Hosting and Design. Celebrating life in the Santa Cruz Mountains. Dr David Hoewisch DC.

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Materials Science, Inc.. - Sputtering and Plasma Source Technology

High Target Utilization - High Performance Magnetron Sputtering Sources,. Power Supplies and Accessories. We Provide Engineered Solutions - Exactly the Right Source for Your Process and System Needs. DC Magnetron Sputtering Power Supplies. With Advanced Arc Suppression. RF Power Supplies and. Polaris 2 and 3 Research Sources. Last modified: 13 January 2017.

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