nano-etch.com

..::: Nano Etch Systems Website :::...

NES Product Features and Performance. NES High Throughput IBE and IBD tools with Large area NES Ion Source and Advanced Motion Control 200 mm, 150mm wafer and 9.5" pallet processing scalable to 300mm. Up to 40% higher throughput with Advanced Motion Controls relative to legacy Ion Beam systems. Ultra low energy NES Ion Source and/or Ultra High Power Etch. Improved uniformity at lower Cost of Ownership. Long Life Grid Sets (2X to 4X longer life). Higher yields through precision ion beam control.

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Nano Etch Systems Inc.

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1502 G●●●●●● Court

Mil●●●tas , California, 95035

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408-●●●●5550

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Nano Etch Systems Inc.

Hari Hegde

2228 Ol●●●●●●●nd Road

San●●●ose , California, 95131

United States

(408)●●●●●-5551

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Nano Etch Systems Inc.

Hari Hegde

1502 G●●●●●● Court

Mil●●●tas , California, 95035

United States

(408)●●●●●-5551

pa●@nano-es.com

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..::: Nano Etch Systems Website :::... | nano-etch.com Reviews

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NES Product Features and Performance. NES High Throughput IBE and IBD tools with Large area NES Ion Source and Advanced Motion Control 200 mm, 150mm wafer and 9.5 pallet processing scalable to 300mm. Up to 40% higher throughput with Advanced Motion Controls relative to legacy Ion Beam systems. Ultra low energy NES Ion Source and/or Ultra High Power Etch. Improved uniformity at lower Cost of Ownership. Long Life Grid Sets (2X to 4X longer life). Higher yields through precision ion beam control.

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..::: Nano Etch Systems Website :::... | nano-etch.com Reviews

https://nano-etch.com

NES Product Features and Performance. NES High Throughput IBE and IBD tools with Large area NES Ion Source and Advanced Motion Control 200 mm, 150mm wafer and 9.5" pallet processing scalable to 300mm. Up to 40% higher throughput with Advanced Motion Controls relative to legacy Ion Beam systems. Ultra low energy NES Ion Source and/or Ultra High Power Etch. Improved uniformity at lower Cost of Ownership. Long Life Grid Sets (2X to 4X longer life). Higher yields through precision ion beam control.

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nano-etch.com

1

..::: Nano Etch Systems Website :::...

http://www.nano-etch.com/software.htm

NES System Software Suite. Powerful, adaptable suite:. The NES Software Suite consists of a set of modules utilizing several techniques of adaptation. Users can customize the system by tailoring activities through the GUI. The software can adapt automatically to the user according to changing conditions. Better User Experience with state of art interface design and 3D visualization:. Configurable Access Management Control:. The suite includes a group of simulators, which are a set of additional software ...

2

..::: Nano Etch Systems Website :::...

http://www.nano-etch.com/aboutus.htm

Founded 2009 by Hari Hegde, PhD. 11,400 square foot facility for design, manufacturing, integration and testing. Capable of building up to 3 cluster tools simultaneously. Scalable through a pending leveraged manufacturing and support. Self-funded with little external debt. NES Facility on Gladding Court, Milpitas, CA 95035. 5 patents applied for Ion Beam technology and systems. 20 years experience in Ion Beam systems and high tech equipment. Proprietary grid and source designs. Best in class uniformity.

3

..::: Nano Etch Systems Website :::...

http://www.nano-etch.com/product.htm

New and Virtual New 200mm IBD / IBE Cluster Tool. New and Virtual New 200mm IBE Cluster Tool. Air Bearing Slider Ion Mill Conversions. Air Bearing Slider Ion Mill Cluster Tool Conversions. Success of NES Pinnacle products is based on their unique ability to deliver Best-in-Class uniformity, Best-in-Class cost of operation combined with competitive pricing. The unique designs available from NES perform substantially better than competing designs. One, Two or Three. IBD, IBE or both. Up to 6 targets. 200mm...

4

..::: Nano Etch Systems Website :::...

http://www.nano-etch.com/index.htm

NES Product Features and Performance. NES High Throughput IBE and IBD tools with Large area NES Ion Source and Advanced Motion Control 200 mm, 150mm wafer and 9.5" pallet processing scalable to 300mm. Up to 40% higher throughput with Advanced Motion Controls relative to legacy Ion Beam systems. Ultra low energy NES Ion Source and/or Ultra High Power Etch. Improved uniformity at lower Cost of Ownership. Long Life Grid Sets (2X to 4X longer life). Higher yields through precision ion beam control.

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..::: Nano Etch Systems Website :::...

NES Product Features and Performance. NES High Throughput IBE and IBD tools with Large area NES Ion Source and Advanced Motion Control 200 mm, 150mm wafer and 9.5" pallet processing scalable to 300mm. Up to 40% higher throughput with Advanced Motion Controls relative to legacy Ion Beam systems. Ultra low energy NES Ion Source and/or Ultra High Power Etch. Improved uniformity at lower Cost of Ownership. Long Life Grid Sets (2X to 4X longer life). Higher yields through precision ion beam control.

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