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Oxide Materials for the Post-Silicon Electronics Era

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Oxide Materials for the Post-Silicon Electronics Era
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ORAMA | orama-fp7.eu Reviews

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Oxide Materials for the Post-Silicon Electronics Era

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Orama FP7 -

http://orama-fp7.eu/en/imprint

Oxide Materials for the Post-Silicon Electronics Era. The Fraunhofer Institute for Surface Engineering and Thin Films IST. Bienroder Weg 54 E. Phone 49 531 2155-0. Fax 49 531 2155-900. Is a constituent entity of the Fraunhofer-Gesellschaft, and as such has no separate legal status. Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Phone: 49 89 1205-0. Fax: 49 89 1205-7531. Simone.kondruweit(at)ist.fraunhofer.de. Additional information according to the Tele Media Act (TMG). Notwithstand...

2

Orama FP7 - Overview

http://orama-fp7.eu/en/overview

Oxide Materials for the Post-Silicon Electronics Era. It will achieve this by addressing four key topics relevant for electronic oxide material development. First principle modelling of oxide materials: Enables us to predict the relevant electronic film properties such as electronic structure, doping and defect mechanisms. Synthesis of new n- and p-type ASOs, new amorphous TCOs and oxide based p-n junctions. Last modified: 2014-12-01 11:05:21 CET. Source: http:/ orama-fp7.eu/en/overview/.

3

Orama FP7 - Schools

http://orama-fp7.eu/en/schools

Oxide Materials for the Post-Silicon Electronics Era. Training schools on oxide materials for electronic applications will be offered during the project. Participation of graduate students and young researchers is highly recommended. 2010-10-20/21, Analipsi, Crete, Greece. 2012-10-19/21, Hersonissos, Crete, Greece. 2014-05-26, Lille, France, E-MRS Spring Meeting. Last modified: 2014-12-01 11:05:21 CET. Source: http:/ orama-fp7.eu/en/schools/.

4

Orama FP7 - Partners

http://orama-fp7.eu/en/partners

Oxide Materials for the Post-Silicon Electronics Era. Zur Förderung der Angewandten Forschung e.V., Germany (Coordinator). Fraunhofer-Institut für Schicht- und Oberflächentechnik IST. Fraunhofer-Institut für Silicatforschung ISC. Fraunhofer-Institut für Werkstoffmechanik IWM. Uninova - Instituto de Desenvolvimento de Novas Tecnologias, Center of Excellence in Microelectronics Optoelectronics and Processes CEMOP. Foundation for Research and Technology Hellas FORTH. Institut Jožef Stefan JSI.

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Orama FP7 - Publications

http://orama-fp7.eu/en/publications

Oxide Materials for the Post-Silicon Electronics Era. Fact Sheet (1.2 MB). News September 2014 (9.1 MB). News August 2013 (5.5 MB). News November 2012 (1.6 MB). Papers in peer-reviewed journals. Szyszka, B. Löbmann, P. Georg, A. May, C. Elsässer, C.: Development of new transparent conductors and device applications utilizing a multidisciplinary approach. In: Thin Solid Films 518/11 (2010) pp. 3109-3114. In: IEEE Electron Device Letters 32 (2011), pp. 1391-1393. In: Physical Review B 84 (2011), pp. 03...

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Links - Fraunhofer IST

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Fraunhofer-Institut für Schicht- und Oberflächentechnik. Fraunhofer-Institut für Schicht- und Oberflächentechnik. Geschichte des Fraunhofer IST. Maschinenbau, Werkzeuge und Fahrzeugtechnik. Life Science und Umwelt. Hier finden Sie eine Sammlung interessanter Websites. Verbund Light and Surfaces. Kompetenznetz INPLAS e.V. Europäische Forschungsgesellschaft Dünne Schichten e.V. Neue Materialien Niedersachsen e.V. DFF - Deutsches Display Forum. Macro, Micro and Nano Aspects of Machining (MaMiNa).

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Oxide Materials for the Post-Silicon Electronics Era. Welcome at the project ORAMA, a large-scale integrating project of 17 enterprises and research institutes, funded by the European Commission. ORAMA addresses the urgent industrial need to develop new high performance multifunctional oxide based electronic materials that have the potential to catapult the electronics industry into a new era of growth. 1st principle material modeling. Synthesis of new materials. 2017 by Fraunhofer IST.

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