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NAKAGAWA Laboratory's Home Page

Last Updated on 28, Mar, 2005. In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method. The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and 'plasma free' condition. Department of Physical Electronics. Faculty of Engineering,. Tokyo Institute of Technology. 2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN.

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NAKAGAWA Laboratory's Home Page | spin.pe.titech.ac.jp Reviews

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Last Updated on 28, Mar, 2005. In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method. The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and 'plasma free' condition. Department of Physical Electronics. Faculty of Engineering,. Tokyo Institute of Technology. 2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN.

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NAKAGAWA Laboratory's Home Page | spin.pe.titech.ac.jp Reviews

https://spin.pe.titech.ac.jp

Last Updated on 28, Mar, 2005. In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method. The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and 'plasma free' condition. Department of Physical Electronics. Faculty of Engineering,. Tokyo Institute of Technology. 2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN.

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Staffs and Members -. Japanese version is here. Nakagawa@pe.titech.ac.jp. Sok Hyun Kong (D2). Shkong@spin.pe.titech.ac.jp. Das@spin.pe.titech.ac.jp. Ota@spin.pe.titech.ac.jp. T-kimura@spin.pe.titech.ac.jp. K mizuno@spin.pe.titech.ac.jp. Msta o@spin.pe.titech.ac.jp. Kamiki@spin.pe.titech.ac.jp. Hironori@spin.pe.titech.ac.jp. Kubota@spin.pe.titech.ac.jp. Haruki@spin.pe.titech.ac.jp. K mat@spin.pe.titech.ac.jp. Yjkim@spin.pe.titech.ac.jp. Kyung Hwan KIM (July, 1997). Naoe@pe.titech.ac.jp.

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NAKAGAWA Laboratory's Home Page

Last Updated on 28, Mar, 2005. In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method. The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and 'plasma free' condition. Department of Physical Electronics. Faculty of Engineering,. Tokyo Institute of Technology. 2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN.

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