plasma source - e-beam evaporator - atomic hydrogen source - sputter gun - vacuum - thin films - electron beam evaporator - UHV - MBE - from tectra GmbH Physikalische Instrumente
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plasmasource - e-beam evaporator - atomic hydrogen source - sputter gun -vacuum - thin films - electron beam evaporator - UHV - MBE - fromtectra GmbH Physikalische Instrumente | tectra.de Reviews
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plasma source - e-beam evaporator - atomic hydrogen source - sputter gun - vacuum - thin films - electron beam evaporator - UHV - MBE - from tectra GmbH Physikalische Instrumente
tectra.de
Atomic Hydrogen Source - thermal hydrogen cracker
http://www.tectra.de/hydrogen.htm
Fax 49 (0)69-720400 •. H-flux Atomic Hydrogen Source with optional shutter. The H-flux Atomic Hydrogen Source is UHV compatible and mounted on a NW35CF (2.75"OD) flange, making the source an easy retrofit to existing vacuum systems. Atomic Hydrogen can be used in surface science and thin film technolgy (MBE, GSMBE) mainly for the following applications:. Damage free in situ cleaning e.g GaAs, InP, Ge and Si. Removal of residual oxygen and carbon. Surfactant - improvement of layer properties during growth.
Sputter Gun - Ion Gun for sample cleaning
http://www.tectra.de/sputter.htm
Fax 49 (0)69-720400 •. Sputter Ion Gun for sample cleaning. The use of microwaves to sustain the plasma allows ions to be extracted at very low energies without the plasma collapsing (down to 25eV) and since there are no hot metal electrodes in the plasma also permits the use of reactive gases such as oxygen and hydrogen. Typical application of the IonEtch is the sputter cleaning of surfaces with Argon bombardment. Pdf version of IonEtch sputter gun data sheet (72kB). Ion beam sputter coating. Due to the...
Faraday cup system for measuring ion current densitiesof positive charged particles
http://www.tectra.de/faraday.htm
Fax 49 (0)69-720400 •. Faraday cup system for measuring lowest ion beam current (for positive charged particles only) comprising of the Faraday Cup Amplifier, Faraday Cup and vacuum feedthrough. Amplifier with direct display in µA/cm² (analog), measurement range: 3, 10, 30, 100, 300 and 1000 µA/cm², Bias voltage -10V, analog output 0-5V (0-100% FS). Faraday Cup FC-70A of Kimball Physics, Input max 2 Watts, Aperture Ø1,596mm (area 2mm²), max operation temperature 150°C. For continuous measurement, the max...
tectraGmbH Physikalische Instrumente: plasma sources (atom source, ion sourceor atom/ion hybrid source), e-beam evaporator, atomic hydrogen source,sputter gun, microwave ion source, vacuum, thin films, surface science,UHV, MBE, Molecular Beam Epitaxy, vacu
http://www.tectra.de/agbs.htm
Fax 49 (0)69-720400 •. A) Unsere Verkaufsbedingungen gelten ausschließlich; entgegenstehende oder von unseren Verkaufsbedingungen abweichende Bedingungen des Bestellers erkennen wir nicht an, es sei denn, wir hätten ausdrücklich schriftlich ihrer Geltung zugestimmt. Unsere Verkaufsbedingungen gelten auch dann, wenn wir in Kenntnis entgegenstehender oder von unseren Verkaufsbedingungen abweichender Bedingungen des Bestellers die Lieferung an den Besteller vorbehaltlos ausführen. A) Unsere Angebote sind in...
tectra GmbH Physikalische Instrumente - Wir über uns-
http://www.tectra.de/ueberuns.htm
Fax 49 (0)69-720400 •. Die tectra GmbH Physikalische Instrumente in Frankfurt/M, Tel.: 069-720040 ist seit 1985 auf den Gebieten Vakuumtechnik, Oberflächenanalytik und Dünnschichttechnik tätig. In erster Linie vertreiben wir Produkte namhafter Firmen aus den USA, England, Schweden, Israel und Deutschland. Dies sind u.a.:. Vakuumkomponenten wie z.B. Durchführungen, Ventile, Flanschbauteile, Manipulatoren etc. Ionen- und Elektronenquelle, Phosphor-Schirme, eV-Parts. TOF-Systeme, MALDI-TOF, MCP-Detektoren.
TOTAL PAGES IN THIS WEBSITE
16
Faraday cup system for measuring ion current densitiesof positive charged particles
http://www.tectra-gmbh.com/faraday.htm
Fax 49 (0)69-720400 •. Faraday cup system for measuring lowest ion beam current (for positive charged particles only) comprising of the Faraday Cup Amplifier, Faraday Cup and vacuum feedthrough. Amplifier with direct display in µA/cm² (analog), measurement range: 3, 10, 30, 100, 300 and 1000 µA/cm², Bias voltage -10V, analog output 0-5V (0-100% FS). Faraday Cup FC-70A of Kimball Physics, Input max 2 Watts, Aperture Ø1,596mm (area 2mm²), max operation temperature 150°C. For continuous measurement, the max...
Atomic Hydrogen Source - thermal hydrogen cracker
http://www.tectra-gmbh.com/hydrogen.htm
Fax 49 (0)69-720400 •. H-flux Atomic Hydrogen Source with optional shutter. The H-flux Atomic Hydrogen Source is UHV compatible and mounted on a NW35CF (2.75"OD) flange, making the source an easy retrofit to existing vacuum systems. Atomic Hydrogen can be used in surface science and thin film technolgy ( MBE, GSMBE ) mainly for the following applications:. Damage free in situ cleaning e.g GaAs, InP, Ge and Si. Removal of residual oxygen and carbon. Post growth surface treatment/improvement. Integral wate...
E-Beam Evaporator - electron beam evaporator
http://www.tectra-gmbh.com/e-flux.htm
Fax 49 (0)69-720400 •. Flux Mini E-Beam Evaporator is an UHV evaporator for small and medium quantities of almost any material in the temperature range of 400K to 3100K. Evaporation is possible either directly from evaporant in rod form (Ø2-6mm) or out of a crucible. An integrated flux monitor allows maximum deposition control. Highly efficient watercooling ensures negligible outgassing during operation. The e. Unique new features of the e-flux mini e-beam evaporator:. LED to alert rod feed. Dual mode op...
Sputter Gun - Ion Gun for sample cleaning
http://www.tectra-gmbh.com/sputter.htm
Fax 49 (0)69-720400 •. The use of microwaves to sustain the plasma allows ions to be extracted at very low energies without the plasma collapsing (down to 25eV) and since there are no hot metal electrodes in the plasma also permits the use of reactive gases such as oxygen and hydrogen. Typical application of the IonEtch is the sputter cleaning of surfaces with Argon bombardment. Pdf version of IonEtch sputter gun data sheet (72kB). Ion beam sputter coating. Please ask for a quote. Due to the evanescent w...
Sputter Gun - Ion Gun for sample cleaning
http://www.tectra-gmbh.com//sputter.htm
Fax 49 (0)69-720400 •. The use of microwaves to sustain the plasma allows ions to be extracted at very low energies without the plasma collapsing (down to 25eV) and since there are no hot metal electrodes in the plasma also permits the use of reactive gases such as oxygen and hydrogen. Typical application of the IonEtch is the sputter cleaning of surfaces with Argon bombardment. Pdf version of IonEtch sputter gun data sheet (72kB). Ion beam sputter coating. Please ask for a quote. Due to the evanescent w...
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16
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plasmasource - e-beam evaporator - atomic hydrogen source - sputter gun -vacuum - thin films - electron beam evaporator - UHV - MBE - fromtectra GmbH Physikalische Instrumente
Fax 49 (0)69-720400 •. Or Atom/Ion Hybrid Source. 2- and 4-pocket e-beam evaporator. Vacuum components catalog for download. Catalog of current feedthroughs (16,5MB). New ITL catalog of flange components (4,7MB). Feedthroughs brochure of MPF. New UHV transport suitcase. Wire, single strand, 7-strand and coax cable. New High Current version. Of IonEtch Sputter gun. E-flux Mini E-Beam Evaporator: new Deposition Controller. New Faraday Cup System. Plasma Source: new remote control options.
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