flotron.net
Plasma Enhanced CVD (PECVD) and Plasma Etching | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/node/85
Plasma Enhanced CVD (PECVD) and Plasma Etching. Mon, 2012-02-27 17:16. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.
flotron.net
FLOTRON™ X | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/flotron-x-system
By Nova Fabrica Ltd. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.
flotron.net
Accessories | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/accessories
Essentially all sensor types used for reactive deposition (magnetron sputtering or evaporation) are geared towards direct or indirect gas and/or vapour composition analysis, monitoring and provision of feedback signals. On the basis of these feedback signals control signals for actuating devices (e.g. mass flow controllers and power supplies) are derived. The following sensor technologies are currently available to use with FloTron systems:. Remote plasma (RP) sensor head,.
flotron.net
FloTron™ Configuration Guide | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/node/36
FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.
flotron.net
FloTron™ H | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/flotron-h-system
FloTron H - a hybrid system that combines two optical monitoring technologies, a CCD-based spectrometer input and photomultiplier tube inputs with narrow bandpass filters. FloTron H thus provides unprecedented level of flexibility for applications where both technologies are required at the same time - all in one compact system. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.
flotron.net
Plasma analysis and emission monitoring by Optical Emission Spectroscopy (OES) | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/node/83
Plasma analysis and emission monitoring by Optical Emission Spectroscopy (OES). Mon, 2012-02-27 17:15. Optical Emission Spectrometry (OES). Geometrical aspects and specifications of a detection system are important. For example absorption of light by the window material is possible. Position of monitoring assembly and the fact that measurements are a line-of-sight type may have influence on the measurement results too.
flotron.net
Reactive Magnetron Sputtering | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/node/86
Mon, 2012-02-27 17:20. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.
flotron.net
FLOTRON™ | FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/flotron-system
FloTron is a high speed multiple channel process control system for reactive magnetron sputtering and ion/plasma processing. FloTron systems can be configured for single or multiple (2 to 7) zone large area processing, and are therefore well suitable for both R&D and manufacturing. By Nova Fabrica Ltd. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.
flotron.net
FloTron :: Multi-channel Plasma Emission Monitoring and Reactive Gas Control
http://www.flotron.net/about
3 fast spectrometer-based models: X3, X5 and X9. Multiple spectrometer versions; single or multiple zone reactive sputtering process control. Industrial communication interfaces for OEM clients. Proprietary PID and PDF algorithms to suite the taste of any process control engineer. What do you think about FloTron.net? Needs to be improved. FloTron : Multi-channel Plasma Emission Monitoring and Reactive Gas Control 2016 Disclaimer.
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