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Gallium nitride (GaN) is a binary III/V direct bandgap semiconductor commonly used in bright light-emitting diodes since the 1990s. The compound is a very hard material that has a Wurtzite crystal structure. Its wide band gap of 3.4 eV affords it special properties for applications in optoelectronic[4][5], high-power and high-frequency devices. For example, GaN is the substrate which makes violet (405 nm) laser diodes possible, without use of nonlinear optical frequency-doubling. Its sensitivity to ionizing

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Gallium Nitride | www-galliumnitride.com Reviews
<META>
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Gallium nitride (GaN) is a binary III/V direct bandgap semiconductor commonly used in bright light-emitting diodes since the 1990s. The compound is a very hard material that has a Wurtzite crystal structure. Its wide band gap of 3.4 eV affords it special properties for applications in optoelectronic[4][5], high-power and high-frequency devices. For example, GaN is the substrate which makes violet (405 nm) laser diodes possible, without use of nonlinear optical frequency-doubling. Its sensitivity to ionizing
<META>
KEYWORDS
1 gallium nitride fet
2 gallium nitride properties
3 gallium nitride electronics
4 gallium nitride wafer
5 gallium nitride lattice constant
6 gallium nitride on silicon
7 gallium nitride nanowires
8 gallium nitride nanoparticles
9 gallium nitride mosfet
10 gan on silicon
CONTENT
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PAGE
gallium nitride,nitride,thermal oxide,pyrex,fused silica,quartz,germanium,zinc,gallium arsenide,sapphire,glass,indium phosphide,graphene,solar wafer,a universitywafer com,web site,ssp and dsp,soi wafers,updated weekly,for mems,name*,company/organization
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Gallium Nitride | www-galliumnitride.com Reviews

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Gallium nitride (GaN) is a binary III/V direct bandgap semiconductor commonly used in bright light-emitting diodes since the 1990s. The compound is a very hard material that has a Wurtzite crystal structure. Its wide band gap of 3.4 eV affords it special properties for applications in optoelectronic[4][5], high-power and high-frequency devices. For example, GaN is the substrate which makes violet (405 nm) laser diodes possible, without use of nonlinear optical frequency-doubling. Its sensitivity to ionizing

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