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CMMP X-ray Photo-electron Spectroscopy

CMMP X-ray Photo-electron Spectroscopy. Wednesday, June 11, 2014. In XPS, unlike Auger spectroscopy where the kinetic energy. Of electrons is presented, the binding energy. Of electrons is presented. In this case, the kinetic energy of the photoelectrons is measured by the analyzer and then converted to binding energy by referencing to the energy of the X-ray excitation source. The relation is:. BE = hv -KE -phi. Is the work function. Of the XPS analyzer. In practice phi. Line is at 1486.6 eV. For a give...

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CMMP X-ray Photo-electron Spectroscopy | xps-cmmp.blogspot.com Reviews
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CMMP X-ray Photo-electron Spectroscopy. Wednesday, June 11, 2014. In XPS, unlike Auger spectroscopy where the kinetic energy. Of electrons is presented, the binding energy. Of electrons is presented. In this case, the kinetic energy of the photoelectrons is measured by the analyzer and then converted to binding energy by referencing to the energy of the X-ray excitation source. The relation is:. BE = hv -KE -phi. Is the work function. Of the XPS analyzer. In practice phi. Line is at 1486.6 eV. For a give...
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CMMP X-ray Photo-electron Spectroscopy | xps-cmmp.blogspot.com Reviews

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CMMP X-ray Photo-electron Spectroscopy. Wednesday, June 11, 2014. In XPS, unlike Auger spectroscopy where the kinetic energy. Of electrons is presented, the binding energy. Of electrons is presented. In this case, the kinetic energy of the photoelectrons is measured by the analyzer and then converted to binding energy by referencing to the energy of the X-ray excitation source. The relation is:. BE = hv -KE -phi. Is the work function. Of the XPS analyzer. In practice phi. Line is at 1486.6 eV. For a give...

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CMMP Scanning Probe Microscopy: Flattening & Flattening Artifacts

http://spm-cmmp.blogspot.com/2011/06/flattening-flattening-artifacts.html

CMMP Scanning Probe Microscopy. Thursday, June 30, 2011. Flattening and Flattening Artifacts. AFM images generally require some post-processing. One method of post-processing is flattening. In this case a polynomial of order n. Is fit and subtracted from every trace and retrace. It is called "flattening" because this method of processing tends to flatten or unroll an AFM image. It is also a potential source of artifacts. To remedy these artifacts stop bands. Grains on a film surface. In these applica...

sem-cmmp.blogspot.com sem-cmmp.blogspot.com

CMMP Scanning Electron Microscopy: Au coating

http://sem-cmmp.blogspot.com/2013/06/au-coating.html

CMMP Scanning Electron Microscopy. Thursday, June 27, 2013. Generally AuPd is used to coat samples as the metal grains are on the order of 20-25 nm. Given that the JEOL 5900 has a resolution on the order of 20 nm at 30 keV and a 6 mm working distance, such grains would never been seen, though they would certainly be seen in a field emission SEM. The figure above shows the fit of Au film thickness versus sputtering time for a 25 mm target distance and a 30 mA plasma current. The fit is: thickness [nm]...

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CMMP Scanning Probe Microscopy: Magnetic Force Microscopy

http://spm-cmmp.blogspot.com/2011/06/magnetic-force-microscopy.html

CMMP Scanning Probe Microscopy. Monday, June 20, 2011. The force exerted on a dipole is the dot product of the dipole moment and the gradient of the field at the surface. In magnetic force microscopy. MFM- these dipole magnetic forces are detected as a change in cantilever phase and amplitude a finite distance above the surface. In an MFM image, the tip is tapped on the surface. To measure the surface morphology, and then rescanned across the surface 50-150 nm above the surface. Fast MFM in Contact Mode.

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CMMP Ellipsometry: Gaertner Ellipsometer

http://ellip-cmmp.blogspot.com/2011/06/gaertner-ellipsometer.html

Friday, June 17, 2011. The CMMP group at the Florida State University Department of Physics has a Gaertner L116B ellipsometer that is available to the local research community. There are no fees for use of this instrument. Fast; non-contact; cost; ideal for Si oxides and nitrides; ideal for materials with well known optical properties for HeNe visible radiation. Subscribe to: Post Comments (Atom). View my complete profile. CMMP Scanning Electron Microscopy. CMMP Scanning Probe Microscopy.

overview-cmmp.blogspot.com overview-cmmp.blogspot.com

CMMP User Facilities: October 2014

http://overview-cmmp.blogspot.com/2014_10_01_archive.html

Wednesday, October 1, 2014. Because of staffing limitations at the CMMP facility, services requiring CMMP staff may involve some delay as instruments and staff time become available. In general, services are provided on a first-come, first server basis. This rule is subject to the discretion of the facility manager according to the availability of instrumentation, staffing, etc. The entries in italics. Are set as high priority, and the projects in red. Are either currently underway or scheduled.

spm-cmmp.blogspot.com spm-cmmp.blogspot.com

CMMP Scanning Probe Microscopy: Tapping AFM: Arabidopsis haliana Grana Membranes

http://spm-cmmp.blogspot.com/2014/03/tapping-afm-arabidopsis-haliana-grana.html

CMMP Scanning Probe Microscopy. Wednesday, March 19, 2014. Tapping AFM: Arabidopsis haliana Grana Membranes. Images of Arabidopsis thaliana. Grana membranes using tapping AFM with the Dimension 3000 AFM. Silicon tapping cantilevers were used, (Olympus. OMCLAC160TS-W2, with 7 nm tip radius and. 42 N/m spring constant), and imaging was performed in air. Grana membranes were isolated through treatment with 2%. Subscribe to: Post Comments (Atom). Tapping AFM: Arabidopsis haliana Grana Membranes.

sem-cmmp.blogspot.com sem-cmmp.blogspot.com

CMMP Scanning Electron Microscopy: EDS Detector Window Absorption

http://sem-cmmp.blogspot.com/2012/04/eds-detector-window-absorption.html

CMMP Scanning Electron Microscopy. Thursday, April 12, 2012. EDS Detector Window Absorption. This graph shows the transmission through several different EDS detector windows. The solid line is for the Moxtek AP1.3, the dot-dashed line for the Moxtek HT2.2 and the dashed line for the Moxtek AP3.3. Our EDS detector has an AP3.3 window. The graph is borrowed from F. Scholze and M. Procop, X-Ray Spectrom. Subscribe to: Post Comments (Atom). Beam Energy and Topography: SE1 and SE2. Kaersutite: Low Energy EDS.

overview-cmmp.blogspot.com overview-cmmp.blogspot.com

CMMP User Facilities: June 2013

http://overview-cmmp.blogspot.com/2013_06_01_archive.html

Sunday, June 30, 2013. Users of the CMMP facilities are requested to recognize the Florida State University Department of Physics Condensed Matter and Material Physics (CMMP) user facility in publications using this lab as a resource. While journal article co-authorship is not required to use the CMMP facilities, please consider offering co-authorship to CMMP staff contributing beyond the scope of routine instrument training and consultation. Subscribe to: Posts (Atom). View my complete profile.

sem-cmmp.blogspot.com sem-cmmp.blogspot.com

CMMP Scanning Electron Microscopy: Dynamic Focus Correction

http://sem-cmmp.blogspot.com/2012/05/dynamic-focus-correction.html

CMMP Scanning Electron Microscopy. Monday, May 7, 2012. The last image shows the same grid at the same tilt and working distance with dynamic focus correction. On Dynamic focus correction allows the SEM objective lens to have a sweep dependent focal length. Since tilting is always in the Y-direction, this focal length dependence is linked to the Y-deflection amplifier. The image shows about 14 mm of the surface in focus, corresponding to a height difference of 13 mm across the length of the sample.

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CMMP X-ray Photo-electron Spectroscopy

CMMP X-ray Photo-electron Spectroscopy. Wednesday, June 11, 2014. In XPS, unlike Auger spectroscopy where the kinetic energy. Of electrons is presented, the binding energy. Of electrons is presented. In this case, the kinetic energy of the photoelectrons is measured by the analyzer and then converted to binding energy by referencing to the energy of the X-ray excitation source. The relation is:. BE = hv -KE -phi. Is the work function. Of the XPS analyzer. In practice phi. Line is at 1486.6 eV. For a give...

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