thomasdalejay.blogspot.com
Thomas D. Jay: The Continuing Evolution of Extreme Ultra Violet Lithography
http://thomasdalejay.blogspot.com/2013/08/the-continuing-evolution-of-extreme.html
Thomas D. Jay. Wednesday, August 7, 2013. The Continuing Evolution of Extreme Ultra Violet Lithography. Producing Extreme Ultra Violet Light With Plasma. Introduced in the year 2012 contains 1.4 billion transistors. Moore's law marches on and future process nodes will soon shrink to 14, 10 and 7nm. Imagine your smart phone's chip sets with the processing power of another billion or so transistors. A Best Of Breed EUV Source? ASML's EUV Source Design. Z-Pinch Discharge Produced Plasma Source Technology.
thomasdalejay.blogspot.com
Thomas D. Jay: Zplasma to Attend SPIE Advanced Lithography 2013 Seeking Xenon Z-pinch EUV Source Funding
http://thomasdalejay.blogspot.com/2013/02/pinch-yourself-zplasma-will-be.html
Thomas D. Jay. Monday, February 18, 2013. Zplasma to Attend SPIE Advanced Lithography 2013 Seeking Xenon Z-pinch EUV Source Funding. At the company's web site. What follows below is a brief introductory description of Zplasma's current research and development effort as conveyed by Henry Berg. The questions related to the following discussion are mine followed by Henry's well articulated answers. Henry Berg, CEO Zplasma, Inc. Zplasma's Xenon Plasma EUV Source Technology. Henry Berg, CEO Zplasma, Inc.
thomasdalejay.blogspot.com
Thomas D. Jay: The EUV Continuum - Have You Seen the Light?
http://thomasdalejay.blogspot.com/2014/08/the-euv-continuum-have-you-seen-light.html
Thomas D. Jay. Tuesday, August 19, 2014. The EUV Continuum - Have You Seen the Light? It is August, 2014. Semicon West has long past and from an EUV perspective not much has changed. Another year, another conference series, and still no news to report on high power EUV product offerings other than another forward looking statement from ASML. Anticipating 100 watt EUV power levels at Semicon West next year. Recently developed EUV resists formulated at Lawrence Berkeley's CXRO. In a July 10, 2014, IBM.
thomasdalejay.blogspot.com
Thomas D. Jay: Report on Recent SPIE Activities – Spring 2013
http://thomasdalejay.blogspot.com/2013/03/report-on-recent-spie-activities-spring_1038.html
Thomas D. Jay. Wednesday, March 20, 2013. Report on Recent SPIE Activities – Spring 2013. Commentary on SPIE Advanced Lithography IV 2013. ASML made a compelling fifty page presentation. Increase resist absorption of EUV light. Reduce the electron affinity of the matrix polymer (reduce electron energy loss that does not result In PAG (Photo Acid Generator) excitation, thus increasing de and C). Increase the electron affinity (and thus the reaction cross-section) of the PAG. Posted on 2/25/2013 describing...
