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UHV鍍膜技術如下：脈衝激光沉積(PLD)、分子束外延(MBE)、電子束沉積(E-Beam)、磁控濺鍍(Sputter)、蒸鍍機(Evaporator)、離子束沉積(IBD)、離子束輔助沉積(IBAD)、OLED Coating System 。

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AdNaNotek - UHV system - adnanohome | adnano-tek.com Reviews

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UHV鍍膜技術如下：脈衝激光沉積(PLD)、分子束外延(MBE)、電子束沉積(E-Beam)、磁控濺鍍(Sputter)、蒸鍍機(Evaporator)、離子束沉積(IBD)、離子束輔助沉積(IBAD)、OLED Coating System 。

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news,techniques,coating technique,pulsed laser deposition pld,molecular beam epitaxy mbe,magnetron sputtering,e beam evporate,results,cigs result,dual e beam result,coating system,mbe 9,sputter 24,du ebeam,integration system,laser heating system,focus

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AdNaNotek - UHV system - adnanohome | adnano-tek.com Reviews

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UHV鍍膜技術如下：脈衝激光沉積(PLD)、分子束外延(MBE)、電子束沉積(E-Beam)、磁控濺鍍(Sputter)、蒸鍍機(Evaporator)、離子束沉積(IBD)、離子束輔助沉積(IBAD)、OLED Coating System 。

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AdNaNoTek IBSD - 20 - AdNaNotek - UHV system

http://www.adnano-tek.com/ibsd---20.html

Dragon Line - 6000. FBBear System Control Software. Thin Film Coating Services. Brochures, Posters, and Catalogs. Awards, Certifications, and Patents. Magnetron Sputtering Deposition (MSD). Ion-Beam Sputter Deposition (IBSD). Molecular Beam Epitaxy (MBE). Pulsed Layer Deposition (PLD). Plasma Enhanced Atomic Layer Deposition (PEALD). Dragon Line - 6000. FBBear System Control Software. Thin Film Coating Services. Brochures, Posters, and Catalogs. Awards, Certifications, and Patents. IBSD - 20) c. 2-in Mag...

2

AdNaNoTek PLD - 12 - AdNaNotek - UHV system

http://www.adnano-tek.com/pld---12.html

Dragon Line - 6000. FBBear System Control Software. Thin Film Coating Services. Brochures, Posters, and Catalogs. Awards, Certifications, and Patents. Magnetron Sputtering Deposition (MSD). Ion-Beam Sputter Deposition (IBSD). Molecular Beam Epitaxy (MBE). Pulsed Layer Deposition (PLD). Plasma Enhanced Atomic Layer Deposition (PEALD). Dragon Line - 6000. FBBear System Control Software. Thin Film Coating Services. Brochures, Posters, and Catalogs. Awards, Certifications, and Patents. In addition, precise c...

3

AdNaNoTek PLD - 18 - AdNaNotek - UHV system

http://www.adnano-tek.com/pld---18.html

Dragon Line - 6000. FBBear System Control Software. Thin Film Coating Services. Brochures, Posters, and Catalogs. Awards, Certifications, and Patents. Magnetron Sputtering Deposition (MSD). Ion-Beam Sputter Deposition (IBSD). Molecular Beam Epitaxy (MBE). Pulsed Layer Deposition (PLD). Plasma Enhanced Atomic Layer Deposition (PEALD). Dragon Line - 6000. FBBear System Control Software. Thin Film Coating Services. Brochures, Posters, and Catalogs. Awards, Certifications, and Patents. PLD - 18 is also insta...

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关于铠柏 - 台湾铠柏科技AdNaNotek - 超高真空(UHV)专家

http://adnano-chs.weebly.com/20851201103811226575.html

24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 28608;光加热系统. 21046;程技术. 25511;制软件. 24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 21046;程技术. 33609;创：. 24180;成&...

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PLD - 18 - 台湾铠柏科技AdNaNotek - 超高真空(UHV)专家

http://adnano-chs.weebly.com/pld---18.html

24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 28608;光加热系统. 21046;程技术. 25511;制软件. 24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 21046;程技术. 36827;样室. 31995;统&...

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双电子束沉积数据分析 - 台湾铠柏科技AdNaNotek - 超高真空(UHV)专家

http://adnano-chs.weebly.com/21452300052337626463277853121525968254542099826512.html

24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 28608;光加热系统. 21046;程技术. 25511;制软件. 24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 21046;程技术. 20026;了替&#2...

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常用蒸镀材料与溅镀速率参考表 - 台湾铠柏科技AdNaNotek - 超高真空(UHV)专家

http://adnano-chs.weebly.com/2412029992339763820826448260091998228293382083689529575214423277134920.html

24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 28608;光加热系统. 21046;程技术. 25511;制软件. 24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 21046;程技术.

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分子束外延(MBE) - 台湾铠柏科技AdNaNotek - 超高真空(UHV)专家

http://adnano-chs.weebly.com/2099823376264632280624310mbe.html

24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 28608;光加热系统. 21046;程技术. 25511;制软件. 24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 21046;程技术. 20998;子束&#2...

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脉冲激光沉积(PLD) - 台湾铠柏科技AdNaNotek - 超高真空(UHV)专家

http://adnano-chs.weebly.com/330332091428608208092778531215pld.html

24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 28608;光加热系统. 21046;程技术. 25511;制软件. 24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 21046;程技术.

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PLD - 12 - 台湾铠柏科技AdNaNotek - 超高真空(UHV)专家

http://adnano-chs.weebly.com/pld---12.html

24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 28608;光加热系统. 21046;程技术. 25511;制软件. 24120;用蒸镀材料与溅镀速率参考表. 34180;膜沉积技术简介. 33033;冲激光沉积(PLD). 20998;子束外延(MBE). 30913;控溅射(Magnetron Sputtering). 30005;子束蒸发(E-Beam Evaporator). 25104;果分析. CiGS研究成果. 21452;电子束沉积数据分析. Gallium Nitride研究成果. 34180;膜沉积系统. 25972;合型系统. 21046;程技术. 36827;样室. 31616;单&...

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