spm-cmmp.blogspot.com
CMMP Scanning Probe Microscopy: Flattening & Flattening Artifacts
http://spm-cmmp.blogspot.com/2011/06/flattening-flattening-artifacts.html
CMMP Scanning Probe Microscopy. Thursday, June 30, 2011. Flattening and Flattening Artifacts. AFM images generally require some post-processing. One method of post-processing is flattening. In this case a polynomial of order n. Is fit and subtracted from every trace and retrace. It is called "flattening" because this method of processing tends to flatten or unroll an AFM image. It is also a potential source of artifacts. To remedy these artifacts stop bands. Grains on a film surface. In these applica...
sem-cmmp.blogspot.com
CMMP Scanning Electron Microscopy: Beam Energy and Topography: SE1 and SE2
http://sem-cmmp.blogspot.com/2012/04/beam-energy-and-topography-se1-and-se2.html
CMMP Scanning Electron Microscopy. Friday, April 20, 2012. Beam Energy and Topography: SE1 and SE2. This is an SEI (secondary electron) image of the exterior surface of the EDS window. The Moxtek AP3.3 window consists of a silicon support with a hexagonal mesh to provide 77% open area covered by ultra-thin layers of polymer, aluminum (to prevent charging) and a proprietary. The morphology of the window dominates, and one can see little "pillows" of window in the regions of the mesh pores. This window...
sem-cmmp.blogspot.com
CMMP Scanning Electron Microscopy: Au coating
http://sem-cmmp.blogspot.com/2013/06/au-coating.html
CMMP Scanning Electron Microscopy. Thursday, June 27, 2013. Generally AuPd is used to coat samples as the metal grains are on the order of 20-25 nm. Given that the JEOL 5900 has a resolution on the order of 20 nm at 30 keV and a 6 mm working distance, such grains would never been seen, though they would certainly be seen in a field emission SEM. The figure above shows the fit of Au film thickness versus sputtering time for a 25 mm target distance and a 30 mA plasma current. The fit is: thickness [nm]...
spm-cmmp.blogspot.com
CMMP Scanning Probe Microscopy: Magnetic Force Microscopy
http://spm-cmmp.blogspot.com/2011/06/magnetic-force-microscopy.html
CMMP Scanning Probe Microscopy. Monday, June 20, 2011. The force exerted on a dipole is the dot product of the dipole moment and the gradient of the field at the surface. In magnetic force microscopy. MFM- these dipole magnetic forces are detected as a change in cantilever phase and amplitude a finite distance above the surface. In an MFM image, the tip is tapped on the surface. To measure the surface morphology, and then rescanned across the surface 50-150 nm above the surface. Fast MFM in Contact Mode.
ellip-cmmp.blogspot.com
CMMP Ellipsometry: Gaertner Ellipsometer
http://ellip-cmmp.blogspot.com/2011/06/gaertner-ellipsometer.html
Friday, June 17, 2011. The CMMP group at the Florida State University Department of Physics has a Gaertner L116B ellipsometer that is available to the local research community. There are no fees for use of this instrument. Fast; non-contact; cost; ideal for Si oxides and nitrides; ideal for materials with well known optical properties for HeNe visible radiation. Subscribe to: Post Comments (Atom). View my complete profile. CMMP Scanning Electron Microscopy. CMMP Scanning Probe Microscopy.
mt-cmmp.blogspot.com
CMMP Magneto-Transport
http://mt-cmmp.blogspot.com/2013/10/these-are-optical-photos-of-ppms.html
Friday, October 25, 2013. These are optical photos of the PPMS resistivity pucks. The CMMP group has three of these so that samples can be contacted while one is in the system. Each puck has three stations that include four contacts for transport measurements. These contacts can be accessed either by our break-out box or the PPMS controller's resistivity bridge depending upon the application. Contacting samples is an art, and CMMP will not do that for you. The availability of three sets of contacts, labe...
overview-cmmp.blogspot.com
CMMP User Facilities: October 2014
http://overview-cmmp.blogspot.com/2014_10_01_archive.html
Wednesday, October 1, 2014. Because of staffing limitations at the CMMP facility, services requiring CMMP staff may involve some delay as instruments and staff time become available. In general, services are provided on a first-come, first server basis. This rule is subject to the discretion of the facility manager according to the availability of instrumentation, staffing, etc. The entries in italics. Are set as high priority, and the projects in red. Are either currently underway or scheduled.
spm-cmmp.blogspot.com
CMMP Scanning Probe Microscopy: Tapping AFM: Arabidopsis haliana Grana Membranes
http://spm-cmmp.blogspot.com/2014/03/tapping-afm-arabidopsis-haliana-grana.html
CMMP Scanning Probe Microscopy. Wednesday, March 19, 2014. Tapping AFM: Arabidopsis haliana Grana Membranes. Images of Arabidopsis thaliana. Grana membranes using tapping AFM with the Dimension 3000 AFM. Silicon tapping cantilevers were used, (Olympus. OMCLAC160TS-W2, with 7 nm tip radius and. 42 N/m spring constant), and imaging was performed in air. Grana membranes were isolated through treatment with 2%. Subscribe to: Post Comments (Atom). Tapping AFM: Arabidopsis haliana Grana Membranes.
sem-cmmp.blogspot.com
CMMP Scanning Electron Microscopy: EDS Detector Window Absorption
http://sem-cmmp.blogspot.com/2012/04/eds-detector-window-absorption.html
CMMP Scanning Electron Microscopy. Thursday, April 12, 2012. EDS Detector Window Absorption. This graph shows the transmission through several different EDS detector windows. The solid line is for the Moxtek AP1.3, the dot-dashed line for the Moxtek HT2.2 and the dashed line for the Moxtek AP3.3. Our EDS detector has an AP3.3 window. The graph is borrowed from F. Scholze and M. Procop, X-Ray Spectrom. Subscribe to: Post Comments (Atom). Beam Energy and Topography: SE1 and SE2. Kaersutite: Low Energy EDS.
sem-cmmp.blogspot.com
CMMP Scanning Electron Microscopy: Which Beam Energy Should I Use?
http://sem-cmmp.blogspot.com/2013/06/which-beam-energy-should-i-use.html
CMMP Scanning Electron Microscopy. Saturday, June 1, 2013. Which Beam Energy Should I Use? Dropping the beam energy 10 keV is shown in the second image. It's clearly the same structure- but it is slightly nuanced. The electron range. Is significantly less at 10 keV, even in a low density matrix like activated charcoal. This results in the enhancement of edge effects. So, which is correct? They all are. The SEM isn't lying. Which is best? Labels: back scattered electrons. Subscribe to: Post Comments (Atom).
