Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
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Dr.LiTHO: Lithography Simulation | drlitho.com Reviews
https://drlitho.com
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
drlitho.com
Dr.LiTHO: Publications
http://www.drlitho.com/html/pages/en_publications_index.html
Bahlmann N., Chandrasekhara V., Erdmann A., Hertel P. and Gerhardt R., Lehmann R., Salz D., Schröteler F., Wallenhorst M., and Dötsch H. Improved design of magneto-optic rib waveguides for optical isolators. Journal of Lightwave Technology. Bisschop De P., Erdmann A., and Rathsfeld A. Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography. Burger S., Zschiedrich L., Schmidt F., and Erdmann A. and Evanschitzky P. Handbook of Photomask Manufacturing Technology.
Dr.LiTHO: Publishing Notes
http://www.drlitho.com/html/pages/en_pub_notes.html
Fraunhofer Institute of Integrated Systems and Device Technology (IISB). 91058 Erlangen, Germany. Is a constituent entity of the Fraunhofer-Gesellschaft, and as such has no separate legal status. Andreas.erdmann@iisb.fraunhofer.de. Zur Foerderung der angewandten Forschung e.V. Phone: 49 (0) 89 / 12 05- 0. Fax: 49 (0) 89 / 12 05-75 31. In accordance with 27 a VAT Tax Act: DE 12951586. Amtsgericht Muenchen (district court). Registration no. VR 4461. 91058 Erlangen, Germany. Notwithstanding this requirement...
Dr.LiTHO: Dr.LiTHO
http://www.drlitho.com/html/pages/en_drlitho_index.html
DrLiTHO is a comprehensive simulation environment for photolithography, developed at the Fraunhofer IISB. Its main focus is on development and research applications. Rigorous electromagnetic field solvers for accurate simulation of light diffraction: finite-difference time-domain (FDTD) and the Waveguide Method. Transfer matrix algorithms for the vectorial description of light propagation in planar wafer stacks; the Dill model for the description of lithographic exposures. Simulation studies for the eval...
Dr.LiTHO: Jobs and Theses
http://www.drlitho.com/html/pages/en_jobs_index.html
Real-time holography of photoresists. Master thesis / Diplomarbeit). Analysis of statistical process fluctuations. Auto-slicing of lithography masks. Bachelor Thesis / Studienarbeit).
Dr.LiTHO: News and Events
http://www.drlitho.com/html/pages/en_events_index.html
11th Lithography Simulation Workshop. September 26-28, 2013 in Hersbruck, Germany. Distribution of Fraunhofer IISB Lithography Simulation Software Dr.LiTHO. Since 2008, the Fraunhofer IISB is marketing its advanced and proven lithography simulation models and software algorithms in its development and research simulator Dr.LiTHO. The software can be purchased from Fraunhofer IISB. DrLiTHO Waveguide with parallelization. A parallelized version of the rigorous EMF solver Waveguide will soon be.
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Supertheme Software
http://www.supertheme.eu/en/project/supertheme-software.html
Circuit Stability Under Process Variability and Electro-Thermal-Mechanical Coupling. Circuit Stability Under Process Variability and Electro-Thermal-Mechanical Coupling. Below you find references to software tools from SUPERTHEME partners which are part of the SUPERTHEME software framework. Lithography Simulator Dr.LiTHO. DrLiTHO is a comprehensive simulation environment for photolithography, developed at the Fraunhofer IISB. Its main focus is on development and research applications. Enigma is the GSS w...
Software
http://www.colisa.eu/en/project-information/software.html
Fraunhofer Institute for Integrated Systems and Device Technology. Fraunhofer Institute for Integrated Systems and Device Technology. Lithography Simulator Dr.LiTHO. DrLiTHO is a comprehensive simulation environment for photolithography, developed at the Fraunhofer IISB. Its main focus is on development and research applications. Navigation and Social Media. Fraunhofer Institute for Integrated Systems and Device Technology. Date: 31.1.2017 21:57.
Partners
http://www.colisa.eu/en/project-information/partners.html
Fraunhofer Institute for Integrated Systems and Device Technology. Fraunhofer Institute for Integrated Systems and Device Technology. Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Computational Lithography and Optics Group. Agencia Estadal Consejo Superior de Investigaciones Científicas (CSIC). Spanish National Research Council (CSIC). Universite de Bordeaux 1. Laboratoire de Chimie des Polymères Organiques (LCPO). National Technical University of Athens (NTUA).
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Kathryn Litherland, Spanish translator and editor
Helping You Hammer Out the Kinks. Someone once told me that T.S. Eliot once said, "Even the best writer. Needs a good editor." I've searched high and low and haven't been able. To verify this quote, but it certainly makes a good story! An editor himself, and yet he employed the services of fellow poet. Ezra Pound to to transform "The Wasteland" from "a jumble of good and. Bad passages" into a watershed work of art. And yet, Ezra Pound. Probably looked to someone else to edit his own writing! Tendency to ...
The Blog of Dr. N. Butyl Lithium
The Blog of Dr. N. Butyl Lithium. Monday, January 18, 2010. I came across Kolbe electrolysis, pretty interesting stuff. basically you take two carboxylic acids, cut off the carboxylic acid groups, and link up the two remaining pieces. Turn acetic acid into ethane and carbon dioxide, i think i might give it a go. Tuesday, March 17, 2009. Got a YouTube Partnership! I'm going to take the team out for dinner. What experiment are we going to do next? We'll think of something. Saturday, January 24, 2009.
Dr.LiTHO: Lithography Simulation
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
Dr.LiTHO: Lithography Simulation
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
Dr.LiTHO: Lithography Simulation
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
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Richardson Orthopedic Surgeons - L & W Orthopaedic Associates
Robert B. Litman, M.D., M.S., M.Phil.
Robert B. Litman, M.D., M.S., M.Phil. Diplomate, American Board of Family Medicine. Fellow, American Academy of Family Physicians. Fellow, American College of Allergy, Asthma and Immunology`. Air sampling data expressed as particles per cubic meter of air per 24 hours. (0-10, Low; 11-25, Moderate; 26-50, High; 50, Very High). Aeroallergen analysis for the week of 21 June 2010 (compiled in Danville, California):. Tree pollens 4 grains Low. Grass pollens 11 grains Moderate. Weed pollens 3 grains Low. Nonsp...
