Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
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Dr.LiTHO: Lithography Simulation | drlitho.de Reviews
https://drlitho.de
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
drlitho.de
Dr.LiTHO: Dr.LiTHO
http://www.drlitho.de/html/pages/en_drlitho_index.html
DrLiTHO is a comprehensive simulation environment for photolithography, developed at the Fraunhofer IISB. Its main focus is on development and research applications. Rigorous electromagnetic field solvers for accurate simulation of light diffraction: finite-difference time-domain (FDTD) and the Waveguide Method. Transfer matrix algorithms for the vectorial description of light propagation in planar wafer stacks; the Dill model for the description of lithographic exposures. Simulation studies for the eval...
Dr.LiTHO: News and Events
http://www.drlitho.de/html/pages/en_events_index.html
11th Lithography Simulation Workshop. September 26-28, 2013 in Hersbruck, Germany. Distribution of Fraunhofer IISB Lithography Simulation Software Dr.LiTHO. Since 2008, the Fraunhofer IISB is marketing its advanced and proven lithography simulation models and software algorithms in its development and research simulator Dr.LiTHO. The software can be purchased from Fraunhofer IISB. DrLiTHO Waveguide with parallelization. A parallelized version of the rigorous EMF solver Waveguide will soon be.
Dr.LiTHO: Publishing Notes
http://www.drlitho.de/html/pages/en_pub_notes.html
Fraunhofer Institute of Integrated Systems and Device Technology (IISB). 91058 Erlangen, Germany. Is a constituent entity of the Fraunhofer-Gesellschaft, and as such has no separate legal status. Andreas.erdmann@iisb.fraunhofer.de. Zur Foerderung der angewandten Forschung e.V. Phone: 49 (0) 89 / 12 05- 0. Fax: 49 (0) 89 / 12 05-75 31. In accordance with 27 a VAT Tax Act: DE 12951586. Amtsgericht Muenchen (district court). Registration no. VR 4461. 91058 Erlangen, Germany. Notwithstanding this requirement...
Dr.LiTHO: Partners
http://www.drlitho.de/html/pages/en_partners_index.html
Dr.LiTHO: Jobs and Theses
http://www.drlitho.de/html/pages/en_jobs_index.html
Real-time holography of photoresists. Master thesis / Diplomarbeit). Analysis of statistical process fluctuations. Auto-slicing of lithography masks. Bachelor Thesis / Studienarbeit).
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Dr.LiTHO: Lithography Simulation
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
Dr.LiTHO: Lithography Simulation
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
Dr.LiTHO: Lithography Simulation
Rigorous Electromagnetic Field Modeling. Contact and Proximity Printing. Optimization Methods and Applications. Research and development work is done in cooperation with national and international industrial and academic partners. Present and former project partners include ASML, CNRS, GenIsys, IMEC, Infineon, LETI, Nikon, Sematech International, PTB, University of Texas in Austin, Vistec, Zeiss and others. more.
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