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CMMP Profilometry

Thursday, July 7, 2011. It will appear as if there is stylus instability. Monday, June 20, 2011. Using a 9429 A standard, it is 0.06% off on the kA scale and -0.31% off on the um scale. Using a 1.74 um standard, it is 0.40% off on the kA scale and 1.15% off on the um scale. Using a 23.13 um standard, it is -0.95% on the um scale. Thursday, June 16, 2011. Friday, June 10, 2011. The scanning profilometer is a complement to SEM. Scanning electron microscopy) and SPM. Fast; very large scan lengths; very larg...

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CMMP Profilometry | prof-cmmp.blogspot.com Reviews
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Thursday, July 7, 2011. It will appear as if there is stylus instability. Monday, June 20, 2011. Using a 9429 A standard, it is 0.06% off on the kA scale and -0.31% off on the um scale. Using a 1.74 um standard, it is 0.40% off on the kA scale and 1.15% off on the um scale. Using a 23.13 um standard, it is -0.95% on the um scale. Thursday, June 16, 2011. Friday, June 10, 2011. The scanning profilometer is a complement to SEM. Scanning electron microscopy) and SPM. Fast; very large scan lengths; very larg...
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CMMP Profilometry | prof-cmmp.blogspot.com Reviews

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Thursday, July 7, 2011. It will appear as if there is stylus instability. Monday, June 20, 2011. Using a 9429 A standard, it is 0.06% off on the kA scale and -0.31% off on the um scale. Using a 1.74 um standard, it is 0.40% off on the kA scale and 1.15% off on the um scale. Using a 23.13 um standard, it is -0.95% on the um scale. Thursday, June 16, 2011. Friday, June 10, 2011. The scanning profilometer is a complement to SEM. Scanning electron microscopy) and SPM. Fast; very large scan lengths; very larg...

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1

CMMP Profilometry: Stylus Damage

http://prof-cmmp.blogspot.com/2011/06/stylus-damage.html

Thursday, June 16, 2011. The profilometer stylus is subject to damage by shear forces- not normal forces. The stylus normal force is regulated by the instrument, but very large shear forces can be applied to the stylus if the sample stage is inappropriately adjusted with the stylus in contact with the surface. Subscribe to: Post Comments (Atom). View my complete profile. CMMP Scanning Electron Microscopy. CMMP Scanning Probe Microscopy. CMMP X-ray Photoelectron Spectroscopy.

2

CMMP Profilometry: July 2011

http://prof-cmmp.blogspot.com/2011_07_01_archive.html

Thursday, July 7, 2011. It will appear as if there is stylus instability. Subscribe to: Posts (Atom). I manage the analytical and fabrication tools in the Condensed Matter and Materials Physics (CMMP) group at Florida State University. Please contact me directly at lochner@cmmp.fsu.edu for information about using any of these research tools. View my complete profile. CMMP Scanning Electron Microscopy. CMMP Scanning Probe Microscopy. CMMP X-ray Photoelectron Spectroscopy.

3

CMMP Profilometry: Alpha Step 200

http://prof-cmmp.blogspot.com/2011/06/alpha-step-200.html

Friday, June 10, 2011. The CMMP group at the Florida State University Department of Physics has a Tencor AlphaStep 200 scanning profilometer that is available to the local research community. There are no fees for use of this instrument. The scanning profilometer is a complement to SEM. Scanning electron microscopy) and SPM. Fast; very large scan lengths; very large vertical depths; good vertical resolution when lateral resolution is not needed; cost. Maximum Scan Length: 10,000 um. Stylus Force: 1-25 mg.

4

CMMP Profilometry: Stylus Stability Test

http://prof-cmmp.blogspot.com/2011/07/stylus-stability-test.html

Thursday, July 7, 2011. It will appear as if there is stylus instability. Subscribe to: Post Comments (Atom). I manage the analytical and fabrication tools in the Condensed Matter and Materials Physics (CMMP) group at Florida State University. Please contact me directly at lochner@cmmp.fsu.edu for information about using any of these research tools. View my complete profile. CMMP Scanning Electron Microscopy. CMMP Scanning Probe Microscopy. CMMP X-ray Photoelectron Spectroscopy.

5

CMMP Profilometry: Current Calibration

http://prof-cmmp.blogspot.com/2011/06/current-calibration.html

Monday, June 20, 2011. Using a 9429 A standard, it is 0.06% off on the kA scale and -0.31% off on the um scale. Using a 1.74 um standard, it is 0.40% off on the kA scale and 1.15% off on the um scale. Using a 23.13 um standard, it is -0.95% on the um scale. Subscribe to: Post Comments (Atom). View my complete profile. CMMP Scanning Electron Microscopy. CMMP Scanning Probe Microscopy. CMMP X-ray Photoelectron Spectroscopy. Simple template. Powered by Blogger.

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spm-cmmp.blogspot.com spm-cmmp.blogspot.com

CMMP Scanning Probe Microscopy: Flattening & Flattening Artifacts

http://spm-cmmp.blogspot.com/2011/06/flattening-flattening-artifacts.html

CMMP Scanning Probe Microscopy. Thursday, June 30, 2011. Flattening and Flattening Artifacts. AFM images generally require some post-processing. One method of post-processing is flattening. In this case a polynomial of order n. Is fit and subtracted from every trace and retrace. It is called "flattening" because this method of processing tends to flatten or unroll an AFM image. It is also a potential source of artifacts. To remedy these artifacts stop bands. Grains on a film surface. In these applica...

sem-cmmp.blogspot.com sem-cmmp.blogspot.com

CMMP Scanning Electron Microscopy: Au coating

http://sem-cmmp.blogspot.com/2013/06/au-coating.html

CMMP Scanning Electron Microscopy. Thursday, June 27, 2013. Generally AuPd is used to coat samples as the metal grains are on the order of 20-25 nm. Given that the JEOL 5900 has a resolution on the order of 20 nm at 30 keV and a 6 mm working distance, such grains would never been seen, though they would certainly be seen in a field emission SEM. The figure above shows the fit of Au film thickness versus sputtering time for a 25 mm target distance and a 30 mA plasma current. The fit is: thickness [nm]...

sem-cmmp.blogspot.com sem-cmmp.blogspot.com

CMMP Scanning Electron Microscopy: EDS Detector Window

http://sem-cmmp.blogspot.com/2012/04/eds-detector-window.html

CMMP Scanning Electron Microscopy. Friday, April 20, 2012. This is an image if the blown EDS window. The right portion shows the exterior surface (towards the chamber) and the left portion shows the interior surface (towards the detector). The interior surface shows clearly the bright hexagnoal silicon grid for supporting the actual window. Subscribe to: Post Comments (Atom). Beam Energy and Topography: SE1 and SE2. EDS Detector Window Absorption. Kaersutite: Low Energy EDS. Optimal WD for EDS.

spm-cmmp.blogspot.com spm-cmmp.blogspot.com

CMMP Scanning Probe Microscopy: Magnetic Force Microscopy

http://spm-cmmp.blogspot.com/2011/06/magnetic-force-microscopy.html

CMMP Scanning Probe Microscopy. Monday, June 20, 2011. The force exerted on a dipole is the dot product of the dipole moment and the gradient of the field at the surface. In magnetic force microscopy. MFM- these dipole magnetic forces are detected as a change in cantilever phase and amplitude a finite distance above the surface. In an MFM image, the tip is tapped on the surface. To measure the surface morphology, and then rescanned across the surface 50-150 nm above the surface. Fast MFM in Contact Mode.

ellip-cmmp.blogspot.com ellip-cmmp.blogspot.com

CMMP Ellipsometry: Gaertner Ellipsometer

http://ellip-cmmp.blogspot.com/2011/06/gaertner-ellipsometer.html

Friday, June 17, 2011. The CMMP group at the Florida State University Department of Physics has a Gaertner L116B ellipsometer that is available to the local research community. There are no fees for use of this instrument. Fast; non-contact; cost; ideal for Si oxides and nitrides; ideal for materials with well known optical properties for HeNe visible radiation. Subscribe to: Post Comments (Atom). View my complete profile. CMMP Scanning Electron Microscopy. CMMP Scanning Probe Microscopy.

mt-cmmp.blogspot.com mt-cmmp.blogspot.com

CMMP Magneto-Transport

http://mt-cmmp.blogspot.com/2013/10/these-are-optical-photos-of-ppms.html

Friday, October 25, 2013. These are optical photos of the PPMS resistivity pucks. The CMMP group has three of these so that samples can be contacted while one is in the system. Each puck has three stations that include four contacts for transport measurements. These contacts can be accessed either by our break-out box or the PPMS controller's resistivity bridge depending upon the application. Contacting samples is an art, and CMMP will not do that for you. The availability of three sets of contacts, labe...

overview-cmmp.blogspot.com overview-cmmp.blogspot.com

CMMP User Facilities: October 2014

http://overview-cmmp.blogspot.com/2014_10_01_archive.html

Wednesday, October 1, 2014. Because of staffing limitations at the CMMP facility, services requiring CMMP staff may involve some delay as instruments and staff time become available. In general, services are provided on a first-come, first server basis. This rule is subject to the discretion of the facility manager according to the availability of instrumentation, staffing, etc. The entries in italics. Are set as high priority, and the projects in red. Are either currently underway or scheduled.

spm-cmmp.blogspot.com spm-cmmp.blogspot.com

CMMP Scanning Probe Microscopy: Tapping AFM: Arabidopsis haliana Grana Membranes

http://spm-cmmp.blogspot.com/2014/03/tapping-afm-arabidopsis-haliana-grana.html

CMMP Scanning Probe Microscopy. Wednesday, March 19, 2014. Tapping AFM: Arabidopsis haliana Grana Membranes. Images of Arabidopsis thaliana. Grana membranes using tapping AFM with the Dimension 3000 AFM. Silicon tapping cantilevers were used, (Olympus. OMCLAC160TS-W2, with 7 nm tip radius and. 42 N/m spring constant), and imaging was performed in air. Grana membranes were isolated through treatment with 2%. Subscribe to: Post Comments (Atom). Tapping AFM: Arabidopsis haliana Grana Membranes.

sem-cmmp.blogspot.com sem-cmmp.blogspot.com

CMMP Scanning Electron Microscopy: EDS Detector Window Absorption

http://sem-cmmp.blogspot.com/2012/04/eds-detector-window-absorption.html

CMMP Scanning Electron Microscopy. Thursday, April 12, 2012. EDS Detector Window Absorption. This graph shows the transmission through several different EDS detector windows. The solid line is for the Moxtek AP1.3, the dot-dashed line for the Moxtek HT2.2 and the dashed line for the Moxtek AP3.3. Our EDS detector has an AP3.3 window. The graph is borrowed from F. Scholze and M. Procop, X-Ray Spectrom. Subscribe to: Post Comments (Atom). Beam Energy and Topography: SE1 and SE2. Kaersutite: Low Energy EDS.

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CMMP Profilometry

Thursday, July 7, 2011. It will appear as if there is stylus instability. Monday, June 20, 2011. Using a 9429 A standard, it is 0.06% off on the kA scale and -0.31% off on the um scale. Using a 1.74 um standard, it is 0.40% off on the kA scale and 1.15% off on the um scale. Using a 23.13 um standard, it is -0.95% on the um scale. Thursday, June 16, 2011. Friday, June 10, 2011. The scanning profilometer is a complement to SEM. Scanning electron microscopy) and SPM. Fast; very large scan lengths; very larg...

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